Aqueous dip-coating composition for electroconductive substrates, comprising dissolved bismuth

ABSTRACT

The present invention relates to an aqueous coating composition (A) having a pH in a range from 4.0 to 6.5 and comprising at least one cathodically depositable binder (A1), a total amount of at least 130 ppm of Bi, based on the total weight of (A), including at least 30 ppm of Bi in a form (A3) in solution in (A) and optionally at least 100 ppm of Bi in a form (A4) not in solution in (A), and at least one at least bidentate complexing agent (A5) suitable for complexing Bi, (A5) being a compound of the general formula (1) or an anion of this compound, for at least partly coating an electrically conductive substrate with an electrocoat material, to a method for producing (A), to the use of (A) for at least partly coating an electrically conductive substrate with an electrocoat material, to a corresponding coating method, to an at least partly coated substrate obtainable by this method, and to a method for setting and/or maintaining the concentration of component (A3) and/or optionally (A4) in the coating composition (A) during the coating method.

The present invention relates to an aqueous coating composition (A) having a pH in a range from 4.0 to 6.5 and comprising at least one cathodically depositable binder (A1), a total amount of at least 130 ppm of Bi, based on the total weight of (A), including at least 30 ppm of Bi in a form (A3) in solution in (A) and optionally at least 100 ppm of Bi in a form (A4) not in solution in (A), and at least one at least bidentate complexing agent (A5) suitable for complexing Bi, (A5) being a compound of the general formula (1) or an anion of this compound, for at least partly coating an electrically conductive substrate with an electrocoat material, to a method for producing (A), to the use of (A) for at least partly coating an electrically conductive substrate with an electrocoat material, to a corresponding coating method, to an at least partly coated substrate obtainable by this method, and to a method for setting and/or maintaining the concentration of component (A3) and/or optionally (A4) in the coating composition (A) during the coating method.

A normal requirement within the automobile sector is that the metallic components used for manufacture must be protected against corrosion. The requirements concerning the corrosion prevention to be achieved are very stringent, especially as the manufacturers often give a guarantee against rust perforation over many years. Such corrosion prevention is normally achieved by coating the components, or the substrates used in their manufacture, with at least one coating apt for the purpose.

A disadvantage of the known coating methods, particularly affecting the known methods employed within the automobile industry, is that these methods normally envisage a phosphatizing pretreatment step, in which the substrate for coating, after an optional cleaning step and before a deposition coating step, is treated with a metal phosphate such as zinc phosphate in a phosphatizing step, in order to ensure adequate corrosion prevention. This pretreatment normally entails the implementation of a plurality of method steps in a plurality of different dipping tanks with different heating. During the implementation of such pretreatment, moreover, waste sludges are produced, which burden the environment and have to be disposed of. On environmental and economic grounds, therefore, it is especially desirable to be able to forgo such a pretreatment step, but nevertheless to achieve at least the same corrosion prevention effect as achieved using the known methods.

EP 2 405 035 A1 and JP 2011-057944 A each disclose an electrophoretically depositable coating composition comprising 100 to 1000 ppm and 100 to 5000 ppm, respectively, of trivalent bismuth ions, and an aminopolycarboxylic acid in 0.5 to 10 times and 0.1 to 5 times, respectively, the molar concentration, based in each case on the molar concentration of the trivalent bismuth ions. Within the coating compositions disclosed therein, the trivalent bismuth ions are in dissolved form. In the case of electrocoating compositions, however, the presence of such acids leads to disadvantages in terms of bath stability, since they are not transferred into the anolyte circuit by the dialysis membranes that are typically used, and so they accumulate in the dip-coating bath. Another disadvantage of the use of such aminopolycarboxylic acids is that their presence in dip-coating baths can lead to problems with wastewater treatment, if these acids enter the wastewater pretreatment systems—as a result, for example, of discharge of ultrafiltrate. If the aminopolycarboxylic acids subsequently reach natural bodies of water, they may pollute them by mobilization of heavy metals. In electrocoating systems, accordingly, these aminopolycarboxylic acids are unwanted and/or their proportion therein should be kept extremely low.

Bismuth lactates which, following their preparation, are added to a coating composition which is electrophoretically depositable on application of a voltage in a range of 100-400 V are known from EP 1 000 985 A1, furthermore. Bismuth salts of aliphatic α-hydroxycarboxylic acids such as lactic acid, for example, are known, furthermore, from WO 93/24578 A1. Water-soluble bismuth compounds which act as a crosslinking catalyst in epoxide-amine-based, electrophoretically depositable coating compositions are known from EP 0 690 106 A1. In that case first of all a basic bismuth compound is converted into a water-soluble form in a preceding process step, by reaction with an inorganic acid or with an organic acid such as an α-hydroxycarboxylic acid, for example. A disadvantage of using such α-hydroxycarboxylic acids in dipping baths, however, is that they have a comparatively low complexing strength for bismuth, meaning that higher fractions of such acids, correspondingly, must be used. The comparatively low coating composition pH that results from this may, however, cause problems in the electrocoating process regime, since coatings already deposited on the substrate may become detached therefrom again. Such detachment may occur in particular in the ultrafiltration rinse zones and also when the process is at a standstill.

WO 98/10024 A1 discloses bismuth compounds as crosslinking catalysts. The bismuth compounds are salts of amino acids such as alanine, glycine, tyrosine, taurine, asparagine, or serine. But a disadvantage of using amino acids of these kinds as complexing agents for bismuth is their comparatively low complexing strength for bismuth.

A need exists for electrophoretically depositable coating compositions for at least partial coating of electrically conductive substrates with an electrocoat material that permit—especially with a view to forgoing the normally implemented phosphatizing pretreatment step—a more economic and more environmental coating method than conventional coating compositions used, while being nevertheless suitable at least in equal degree for achieving the corrosion prevention effect necessary for such compositions.

It is an object of the present invention, therefore, to provide a coating composition for at least partial coating of an electrically conductive substrate that has advantages over the coating compositions known from the prior art. In particular it is an object of the present invention to provide coating compositions which permit a more economic and/or environmental coating method than conventional coating compositions used. In particular it is an object of the present invention, moreover, to provide a method which allows more economic and/or environmental coating than conventional coating methods, which, in other words, makes it possible, for example, to forgo the phosphatizing which must normally be carried out by means of a metal phosphate even prior to deposition coating, but with which, nevertheless, at least the same, and more particularly an enhanced, corrosion prevention effect can be achieved than is achieved with the normal methods.

This object is achieved by the subject matter claimed in the claims and also by the preferred embodiments of that subject matter that are described in the description hereinafter.

A first subject of the present invention is therefore an aqueous coating composition (A) comprising

-   -   (A1) at least one cathodically depositable binder and     -   (A2) optionally at least one crosslinking agent,         the coating composition (A) having a pH in a range from 4.0 to         6.5,         for at least partly coating an electrically conductive substrate         with an electrocoat material,         wherein the coating composition (A) comprises a total amount of         at least 130 ppm of bismuth, based on the total weight of the         coating composition (A), including     -   (A3) at least 30 ppm of bismuth, based on the total weight of         the coating composition (A), in a form in which it is in         solution in the coating composition (A), and     -   (A4) optionally at least 100 ppm of bismuth, based on the total         weight of the coating composition (A), in a form in which it is         not in solution in the coating composition (A), and         the coating composition (A) further comprises     -   (A5) at least one at least bidentate complexing agent suitable         for complexing bismuth,         the at least one complexing agent (A5) being a compound of the         general formula (1) or an anion of said compound

in which R¹ is a C₁₋₆ aliphatic radical substituted by at least one OH group, m is 0 or 1, R^(a) and R^(b) in each case independently of one another are selected from the group consisting of H and C₁₋₆ aliphatic radicals, optionally substituted by at least one OH group, R², R³, R⁴, and R⁵ in each case independently of one another are H or are a C₁₋₆ aliphatic radical optionally substituted by at least one OH group, n is 1 or 2, o is 1 or 2, p is 0, 1, 2, or 3, and

-   R⁶ is C(═O)OH, S(═O)₂OH, P(═O) (OH)₂, NR⁷R⁸, or a C₁₋₆ aliphatic     radical which is substituted by at least one OH group,     -   where R⁷ and R⁸ in each case independently of one another are         selected from the group consisting of H and C₁₋₆ aliphatic         radicals which are optionally substituted by at least one OH         group,     -   with the proviso that at least one of the radicals R⁷ and R⁸ is         a C₁₋₆ aliphatic radical which is substituted by at least one OH         group.

The aqueous coating composition (A) of the invention therefore serves for producing an electrocoat on a substrate surface of an electrically conductive substrate.

It has surprisingly been found that the aqueous coating composition (A) of the invention, particularly when used in a method for at least partly coating an electrically conductive substrate with an electrocoat material, makes it possible to be able to forgo the step normally needing to be carried out prior to deposition coating, more particularly electrocoating, namely the step of pretreating the electrically conductive substrate for at least partial coating with a metal phosphate such as zinc phosphate in order to form a metal phosphate layer on the substrate, thereby allowing the coating method in question to be made overall not only more economical, more particularly less time-consuming and cost-intensive, but also more environmental than conventional methods.

In particular it has surprisingly been found that the coating composition (A) of the invention allows the provision of electrically conductive substrates, coated at least partly with an electrocoat material, which in comparison to substrates coated accordingly by conventional methods have at least no disadvantages, and in particular have advantages, in terms of their corrosion prevention effect.

It has further surprisingly been found that a method for at least partly coating an electrically conductive substrate that uses the coating composition of the invention makes it possible to obtain significant Bi coating of the substrate, more particularly of not less than 20 mg/m² Bi, in particular through a two-stage step (1) and, within this step (1), through stage (1a).

It has surprisingly been found, moreover, that the method of the invention makes it possible to provide coated substrates with good corrosion prevention effect, while forgoing the use of environmentally harmful compounds such as aminopolycarboxylic acid which, moreover, may accumulate in the dip-coating bath, meaning that sufficient stability for the dip-coating bath is not ensured.

It has surprisingly been found, moreover, that the coating composition (A) of the invention makes it possible, in particular if it additionally comprises componment (A4), to forgo a separate method step that is normally necessary for preparing the coating composition, namely the preparation of a water-soluble bismuth-containing compound, which then normally must be added only to the coating composition.

It has surprisingly been found, furthermore, that the coating composition (A) of the invention makes it possible to prevent accumulation of the complexing agent (A5) in the coating composition (A), in particular if the coating composition (A) additionally comprises component (A4). Such resultant accumulation of the complexing agent (A5) in the coating composition may normally lead to problems with the stability of the dipping bath. Surprisingly, this can be counteracted in particular by increasing the fraction of component (A4) optionally present in the coating composition (A). This is made possible in particular by a method for setting and/or maintaining the concentration of component (A3) and/or optionally (A4) in the coating composition (A) of the invention during the implementation of the coating method of the invention.

In one preferred embodiment, the term “comprising” in the sense of the present invention, as for example in connection with the aqueous coating composition (A) of the invention, has the meaning of “consisting of”. With regard to the coating composition (A) of the invention in this preferred embodiment, one or more of the further components identified below and optionally present in the coating composition (A) used in accordance with the invention may be present in the coating composition (A), such as—besides (A1), (A3), (A5), and water, and also, optionally, (A2) and optionally (A4)—for example, the optional components (A6) and/or (A7) and/or (A8), and also organic solvents optionally present. All of these components may each be present in their preferred embodiments, as identified above and below, in the coating composition (A) used in accordance with the invention.

Substrate

Suitable electrically conductive substrates used in accordance with the invention are all of the electrically conductive substrates known to the skilled person that are customarily employed. The electrically conductive substrates used in accordance with the invention are preferably selected from the group consisting of steel, preferably steel selected from the group consisting of cold-rolled steel, galvanized steel such as dip-galvanized steel, alloy-galvanized steel (such as Galvalume, Galvannealed, or Galfan, for example) and aluminumized steel, aluminum, and magnesium; particularly suitable are galvanized steel and aluminum. Suitable as substrates, moreover, are hot-rolled steel, high-strength steel, Zn/Mg alloys, and Zn/Ni alloys. Particularly suitable substrates are parts of bodies or complete bodies of automobiles for production. The method of the invention can also be used for coil coating. Before the electrically conductive substrate in question is used, the substrate is preferably cleaned and/or degreased.

The electrically conductive substrate used in accordance with the invention may be a substrate pretreated with at least one metal phosphate. The electrically conductive substrate used in accordance with the invention may, moreover, be a chromate substrate. Such pretreatment by phosphatizing or chromating, which normally takes place after the substrate has been cleaned and before it is dip-coated, is, in particular, a pretreatment step customary within the automobile industry. In this context it is especially desirable for a pretreatment, carried out optionally, to be designed advantageously from environmental and/or economic aspects. Therefore, for example, an optional pretreatment step is possible in which instead of a customary trication phosphatizing, the nickel component is omitted and instead a dication phosphatizing (comprising zinc and manganese cations and no nickel cations) is carried out on the electrically conductive substrate used in accordance with the invention, prior to coating with the aqueous coating composition (A).

A specific object of the present invention, however, is that it is possible to forgo such pretreatment of the electrically conductive substrate for at least partial coating, by phosphatizing with a metal phosphate such as zinc phosphate, for example, or by means of chromating. In one preferred embodiment, therefore, the electrically conductive substrate used in accordance with the invention is not such a phosphate or chromate substrate.

Prior to being coated with the aqueous coating composition (A) of the invention, the electrically conductive substrate used in accordance with the invention may be pretreated with an aqueous pretreatment composition which comprises at least one water-soluble compound containing at least one Ti atom and/or at least one Zr atom and which comprises at least one water-soluble compound as a source of fluoride ions, containing at least one fluorine atom, or with an aqueous pretreatment composition which comprises a water-soluble compound obtainable by reaction of at least one water-soluble compound containing at least one Ti atom and/or at least one Zr atom with at least one water-soluble compound as a source of fluoride ions, containing at least one fluorine atom.

The at least one Ti atom and/or the at least one Zr atom in this case preferably have the +4 oxidation state. By virtue of the components it contains and preferably by virtue, moreover, of the appropriately selected proportions of these components, the aqueous pretreatment composition preferably comprises a fluoro complex, such as a hexafluorometallate, i.e., in particular, hexafluorotitanate and/or at least one hexafluorozirconate. The pretreatment composition preferably has a total concentration of the elements Ti and/or Zr which is not below 2.5·10⁻⁴ mol/L but is not greater than 2.0·10⁻² mol/L. The preparation of such pretreatment compositions and their use in the pretreatment of electrically conductive substrates are known from WO 2009/115504 A1, for example.

The pretreatment composition preferably further comprises copper ions, preferably copper(II) ions, and also, optionally, one or more water-soluble and/or water-dispersible compounds comprising at least one metal ion selected from the group consisting of Ca, Mg, Al, B, Zn, Mn and W, and also mixtures thereof, preferably at least one aluminosilicate, and more particularly one having an atomic ratio of Al to Si atoms of at least 1:3. The preparation of such pretreatment compositions and their use in the pretreatment of electrically conductive substrates are known from WO 2009/115504 A1, for example. The aluminosilicates are present preferably in the form of nanoparticles having an average particle size in the range from 1 to 100 nm as determinable by dynamic light scattering. The average particle size for such nanoparticles, in the range from 1 to 100 nm, as determinable by dynamic light scattering, is determined in accordance with DIN ISO 13321 (date: Oct. 1, 2004).

In one preferred embodiment, however, the electrically conductive substrate used in accordance with the invention is a substrate which has not been pretreated with any such pretreatment composition.

Component (A1) and Optional Component (A2)

The aqueous coating composition (A) used in accordance with the invention comprises at least one cathodically depositable binder as component (A1) and optionally at least one crosslinking agent as component (A2).

The term “binder” as part of the coating composition (A) encompasses for the purposes of the present invention preferably the cathodically depositable polymeric resins, those responsible for film-forming, of the aqueous coating composition (A) used in accordance with the invention, although any crosslinking agent present is not included in the concept of the binder. A “binder” in the sense of the present invention is therefore a polymeric resin, although any crosslinking agent present is not included in the concept of the binder. In particular, moreover, any pigments and fillers present are not subsumed within the concept of the binder. Thus, component (A5) also cannot be subsumed by the concept of the binder.

The coating composition (A) used in accordance with the invention is preferably prepared using an aqueous dispersion or aqueous solution, more preferably at least one aqueous dispersion, which comprises the at least one cathodically depositable binder (A1) and the optionally present at least one crosslinking agent (A2). This aqueous dispersion or solution comprising (A1) and optionally (A2) preferably has a nonvolatile fraction, i.e., a solids content, in a range from 25 to 60 wt %, more preferably in a range from 27.5 to 55 wt %, very preferably in a range from 30 to 50 wt %, more preferably still in a range from 32.5 to 45 wt %, more particularly in a range from 35 to 42.5 wt %, based in each case on the total weight of this aqueous dispersion or solution.

Methods for determining the solids content are known to the skilled person. The solids content is determined preferably according to DIN EN ISO 3251 (date: Jun. 1, 2008), in particular over a duration of 30 minutes at 180° C. as per that standard.

The skilled person knows of cathodically depositable binders (A1). Very preferably the binder is a cathodically depositable binder. The inventively employed binder is preferably a binder dispersible or soluble in water.

All customary cathodically depositable binders known to the skilled person are suitable here as binder component (A1) of the aqueous coating composition (A) used in accordance with the invention.

The binder (A1) preferably has reactive functional groups which permit a crosslinking reaction. The binder (A1) here is a self-crosslinking or an externally crosslinking binder, preferably an externally crosslinking binder. In order to permit a crosslinking reaction, therefore, the coating composition (A) preferably further includes at least one crosslinking agent (A2) as well as the at least one binder (A1).

The binder (A1) present in the coating composition (A), or the crosslinking agent (A2) optionally present, is preferably thermally crosslinkable. The binder (A1) and the crosslinking agent (A2) optionally present are preferably crosslinkable on heating to temperatures above room temperature, i.e., above 18-23° C. The binder (A1) and the crosslinking agent (A2) optionally present are preferably crosslinkable only at oven temperatures ≥80° C., more preferably ≥110° C., very preferably ≥130° C., and especially preferably ≥140° C. With particular advantage the binder (A1) and the crosslinking agent (A2) optionally present are crosslinkable at 100 to 250° C., more preferably at 125 to 250° C., and very preferably at 150 to 250° C.

The coating composition (A) preferably comprises at least one binder (A1) which has reactive functional groups which permit a crosslinking reaction preferably in combination with at least one crosslinking agent (A2).

Any customary crosslinkable reactive functional group known to the skilled person is contemplated here. The binder (A1) preferably has reactive functional groups selected from the group consisting of optionally substituted primary amino groups, optionally substituted secondary amino groups, substituted tertiary amino groups, hydroxyl groups, thiol groups, carboxyl groups, groups which have at least one C═C double bond, such as vinyl groups or (meth)acrylate groups, for example, and epoxide groups, it being possible for the primary and secondary amino groups to be substituted by 1 or 2 or 3 substituents in each case independently of one another selected from the group consisting of C₁₋₆ aliphatic radicals such as methyl, ethyl, n-propyl or isopropyl, for example, and it being possible for these C₁₋₆ aliphatic radicals in turn to be substituted optionally by 1, 2, or 3 substituents in each case independently of one another selected from the group consisting of OH, NH₂, NH(C₁₋₆ alkyl), and N(C₁₋₆ alkyl)₂. Particularly preferred is at least one binder (A1) which has reactive functional groups selected from the group consisting of optionally substituted primary amino groups, optionally substituted secondary amino groups, and hydroxyl groups, it being possible for the primary and secondary amino groups to be substituted optionally by 1 or 2 or 3 substituents in each case independently of one another selected from the group consisting of C₁₋₆ aliphatic radicals such as methyl, ethyl, n-propyl, or isopropyl, for example, and it being possible for these C₁₋₆ aliphatic radicals in turn to be substituted optionally by 1, 2, or 3 substituents in each case independently of one another selected from the group consisting of OH, NH₂, NH(C₁₋₆alkyl), and N(C₁₋₆ alkyl)₂. The reactive functional groups here, especially the optionally substituted primary and secondary amino groups, may optionally be present at least partly in protonated form.

With particular preference the binder (A1) has tertiary amino groups optionally present at least partly in protonated form, very preferably tertiary amino groups which in each case independently of one another have at least two C₁₋₃ alkyl groups each substituted at least singly by a hydroxyl group, more particularly having in each case independently of one another two hydroxyethyl groups, two hydroxypropyl groups, or one hydroxypropyl and one hydroxyethyl group, the binder (A1) preferably being at least one polymeric resin. Such binders may be obtained, for example, by a method which is described in JP 2011-057944 A.

The binder (A1) present in the coating composition (A) is preferably at least one acrylate-based polymeric resin and/or at least one epoxide-based polymeric resin, more particularly at least one cationic epoxide-based and amine-modified resin. The preparation of cationic, amine-modified, epoxide-based resins of this kind is known and is described in, for example, DE 35 18 732, DE 35 18 770, EP 0 004 090, EP 0 012 463, EP 0 961 797 B1, and EP 0 505 445 B1. Cationic epoxide-based amine-modified resins are understood preferably to be reaction products of at least one optionally modified polyepoxide, i.e., of at least one optionally modified compound having two or more epoxide groups, with at least one preferably water-soluble amine, preferably with at least one such primary and/or secondary amine. Particularly preferred polyepoxides are polyglycidyl ethers of polyphenols and are prepared from polyphenols and epihalohydrines. Polyphenols that may be used include, in particular, bisphenol A and/or bisphenol F. Other suitable polyepoxides are polyglycidyl ethers of polyhydric alcohols, such as ethylene glycol, diethylene glycol, triethylene glycol, 1,2-propylene glycol, 1,3-propylene glycol, 1,5-pentanediol, 1,2,6-hexanetriol, glycerol, and 2,2-bis(4-hydroxycyclohexyl)propane. Modified polyepoxides are those polyepoxides in which some of the reactive functional groups have undergone reaction with at least one modifying compound. Examples of such modifying compounds are as follows:

a) compounds containing carboxyl groups, such as saturated or unsaturated monocarboxylic acids (e.g., benzoic acid, linseed oil fatty acid, 2-ethylhexanoic acid, Versatic acid), aliphatic, cycloaliphatic and/or aromatic dicarboxylic acids of various chain lengths (e.g., adipic acid, sebacic acid, isophthalic acid, or dimeric fatty acids), hydroxyalkylcarboxylic acids (e.g., lactic acid, dimethylolpropionic acid), and carboxyl-containing polyesters, or b) compounds containing amino groups, such as diethylamine or ethylhexylamine or diamines having secondary amino groups, e.g., N,N′-dialkyl-alkylenediamines, such as dimethylethylenediamine, N,N′-dialkyl-polyoxyalkyleneamines, such as N,N′-dimethylpolyoxypropylenediamine, cyanalkylated alkylenediamines, such as bis-N,N′-cyanethyl-ethylenediamine, cyanalkylated polyoxyalkyleneamines, such as bis-N,N′-cyanethylpolyoxypropylenediamine, polyaminoamides, such as Versamides, for example, especially amino-terminated reaction products of diamines (e.g., hexamethylenediamine), polycarboxylic acids, especially dimer fatty acids, and monocarboxylic acids, especially fatty acids, or the reaction product of one mole of diaminohexane with two moles of monoglycidyl ether, or monoglycidyl esters, especially glycidyl esters of α-branched fatty acids, such as of Versatic acid, or c) compounds containing hydroxyl groups, such as neopentyl glycol, bisethoxylated neopentyl glycol, neopentyl glycol hydroxypivalate, dimethylhydantoin-N—N′-diethanol, hexane-1,6-diol, hexane-2,5-diol, 1,4-bis(hydroxymethyl)cyclohexane, 1,1-isopropylidenebis(p-phenoxy)-2-propanol, trimethylolpropane, pentaerythritol, or amino alcohols, such as triethanolamine, methyldiethanolamine, or hydroxyl-containing alkylketimines, such as aminomethylpropane-1,3-diol methyl isobutylketimine or tris(hydroxymethyl)aminomethane cyclohexanone ketimine, and also polyglycol ethers, polyester polyols, polyether polyols, polycaprolactone polyols, polycaprolactam polyols of various functionalities and molecular weights, or d) saturated or unsaturated fatty acid methylesters, which are transesterified in the presence of sodium methoxide with hydroxyl groups of the epoxy resins.

Examples of amines which can be used are mono- and dialkylamines, such as methylamine, ethylamine, propylamine, butylamine, dimethylamine, diethylamine, dipropylamine, methylbutylamine, alkanolamines, such as methylethanolamine or diethanolamine, for example, and dialkylaminoalkylamines, such as dimethylaminoethylamine, diethylaminopropylamine, or dimethylaminopropylamine, for example. The amines that can be used may also contain other functional groups as well, provided these groups do not disrupt the reaction of the amine with the epoxide group of the optionally modified polyepoxide and also do not lead to gelling of the reaction mixture. Secondary amines are preferably used. The charges which are needed for dilutability with water and for electrical deposition may be generated by protonation with water-soluble acids (e.g., boric acid, formic acid, acetic acid, lactic acid, preferably acetic acid). A further possibility for introducing cationic groups into the optionally modified polyepoxide lies in the reaction of epoxide groups in the polyepoxide with amine salts.

Besides the at least one cathodically depositable binder (A1), the coating composition (A) preferably comprises at least one crosslinking agent (A2) which permits a crosslinking reaction with the reactive functional groups of the binder (A1).

All customary crosslinking agents (A2) known to the skilled person may be used, such as phenolic resins, polyfunctional Mannich bases, melamine resins, benzoguanamine resins, epoxides, free polyisocyanates and/or blocked polyisocyanates, particularly blocked polyisocyanates.

A particularly preferred crosslinking agent (A2) is a blocked polyisocyanate. Blocked polyisocyanates which can be utilized are any polyisocyanates such as diisocyanates, for example, in which the isocyanate groups have been reacted with a compound and so the blocked polyisocyanate formed is stable in particular with respect to hydroxyl and amino groups, such as primary and/or secondary amino groups, at room temperature, i.e., at a temperature of 18 to 23° C., but reacts at elevated temperatures, as for example at ≥80° C., more preferably ≥110° C., very preferably ≥130° C., and especially preferably ≥140° C., or at 90° C. to 300° C. or at 100 to 250° C., more preferably at 125 to 250° C., and very preferably at 150 to 250° C.

In the preparation of the blocked polyisocyanates it is possible to use any desired organic polyisocyanates that are suitable for crosslinking. Isocyanates used are preferably (hetero)aliphatic, (hetero)cycloaliphatic, (hetero)aromatic, or (hetero)aliphatic-(hetero)aromatic isocyanates. Preferred are diisocyanates which contain 2 to 36, more particularly 6 to 15, carbon atoms. Preferred examples are 1,2-ethylene diisocyanate, 1,4-tetramethylene diisocyanate, 1,6-hexamethylene diisocyanate (HDI), 2,2,4(2,4,4)-trimethyl-1,6-hexamethylene diisocyanate (TMDI), diphenylmethane diisocyanate (MDI), 1,9-diisocyanato-5-methylnonane, 1,8-diisocyanato-2,4-dimethyloctane, 1,12-dodecane diisocyanate, ω,ω′-diisocyanatodipropyl ether, cyclobutene 1,3-diisocyanate, cyclohexane 1,3- and 1,4-diisocyanate, 3-isocyanatomethyl-3,5,5-trimethylcyclohexyl isocyanate (isophorone diisocyanate, IPDI), 1,4-diisocyanatomethyl-2,3,5,6-tetramethylcyclohexane, decahydro-8-methyl-1,4-methanonaphthalen-2 (or 3),5-ylenedimethylene diisocyanate, hexahydro-4,7-methanoindan-1 (or 2),5 (or 6)-ylenedimethylene diisocyanate, hexahydro-4,7-methanoindan-1 (or 2),5 (or 6)-ylene diisocyanate, 2,4- and/or 2,6-hexahydrotolylene diisocyanate (H6-TDI), 2,4- and/or 2,6-tolylene diisocyanate (TDI), perhydro-2,4′-diphenylmethane diisocyanate, perhydro-4,4′-diphenylmethane diisocyanate (H₁₂MDI), 4,4′-diisocyanato-3,3′,5,5′-tetramethyldicyclohexylmethane, 4,4′-diisocyanato-2,2′,3,3′,5,5′,6,6′-octamethyldicyclohexylmethane, ω,ω′-diisocyanato-1,4-diethylbenzene, 1,4-diisocyanatomethyl-2,3,5,6-tetramethylbenzene, 2-methyl-1,5-diisocyanatopentane (MPDI), 2-ethyl-1,4-diisocyanatobutane, 1,10-diisocyanatodecane, 1,5-diisocyanatohexane, 1,3-diisocyanatomethylcyclohexane, 1,4-diisocyanatomethylcyclohexane, 2,5(2,6)-bis(isocyanatomethyl)bicyclo[2.2.1]heptane (NBDI), and also any mixture of these compounds. Polyisocyanates of higher isocyanate functionality may also be used. Examples thereof are trimerized hexamethylene diisocyanate and trimerized isophorone diisocyanate. Furthermore, mixtures of polyisocyanates may also be utilized. The organic polyisocyanates contemplated as crosslinking agents (A2) for the invention may also be prepolymers, deriving, for example, from a polyol, including from a polyether polyol or a polyester polyol. Especially preferred are 2,4-toluene diisocyanate and/or 2,6-toluene diisocyanate (TDI), and/or isomer mixtures of 2,4-toluene diisocyanate and 2,6-toluene diisocyanate, and/or diphenylmethane diisocyanate (MDI).

Used preferably for the blocking of polyisocyanates may be any desired suitable aliphatic, cycloaliphatic, or aromatic alkyl monoalcohols. Examples thereof are aliphatic alcohols, such as methyl, ethyl, chloroethyl, propyl, butyl, amyl, hexyl, heptyl, octyl, nonyl, 3,3,5-trimethylhexyl, decyl, and lauryl alcohol; cycloaliphatic alcohols such as cyclopentanol and cyclohexanol; aromatic alkyl alcohols, such as phenylcarbinol and methylphenylcarbinol. Other suitable blocking agents are hydroxylamines, such as ethanolamine, oximes, such as methyl ethyl ketone oxime, acetone oxime, and cyclohexanone oxime, and amines, such as dibutylamine and diisopropylamine.

The relative weight ratio of the at least one binder (A1) to the optionally present at least one crosslinking agent (A2) in the coating composition (A) used in accordance with the invention is preferably in a range from 4:1 to 1.1:1, more preferably in a range from 3:1 to 1.1:1, very preferably in a range from 2.5:1 to 1.1:1, more particularly in a range from 2.1:1 to 1.1:1, based in each case on the solids content of the at least one binder (A1) and of the at least one crosslinking agent (A2) in the coating composition (A).

In another preferred embodiment, the relative weight ratio of the at least one binder (A1) to the optionally present at least one crosslinking agent (A2) in the coating composition (A) used in accordance with the invention is in a range from 4:1 to 1.5:1, more preferably in a range from 3:1 to 1.5:1, very preferably in a range from 2.5:1 to 1.5:1, more particularly in a range from 2.1:1 to 1.5:1, based in each case on the solids content of the at least one binder (A1) and of the at least one crosslinking agent (A2) in the coating composition (A).

Coating Composition (A)

The aqueous coating composition (A) of the invention is suitable for at least partly coating an electrically conductive substrate with an electrocoat material, meaning that it is apt to be applied at least partly in the form of an electrocoat to the substrate surface of an electrically conductive substrate. Preferably the entire aqueous coating composition (A) of the invention is cathodically depositable.

The aqueous coating compositions (A) of the invention comprise water as liquid diluent.

The term “aqueous” in connection with the coating composition (A) refers preferably to liquid coating compositions (A) which comprise water as the main component of their liquid diluent, i.e., as liquid solvent and/or dispersion medium. Optionally, however, the coating compositions (A) may include at least one organic solvent in minor fractions. Examples of such organic solvents include heterocyclic, aliphatic or aromatic hydrocarbons, mono- or polyhydric alcohols, especially methanol and/or ethanol, ethers, esters, ketones, and amides, such as, for example, N-methylpyrrolidone, N-ethylpyrrolidone, dimethyl-formamide, toluene, xylene, butanol, ethyl glycol and butyl glycol and also their acetates, butyl diglycol, diethylene glycol dimethyl ether, cyclohexanone, methyl ethyl ketone, methylisobutyl ketone, acetone, isophorone, or mixtures thereof. The fraction of these organic solvents is preferably not more than 20.0 wt %, more preferably not more than 15.0 wt %, very preferably not more than 10.0 wt %, more particularly not more than 5.0 wt % or not more than 4.0 wt % or not more than 3.0 wt %, more preferably still not more than 2.5 wt % or not more than 2.0 wt % or not more than 1.5 wt %, most preferably not more than 1.0 wt % or not more than 0.5 wt %, based in each case on the total fraction of the liquid diluents—i.e., liquid solvents and/or dispersion media—that are present in coating composition (A).

Fractions in % by weight of all components included in the coating composition (A) of the invention, in other words the fractions of (A1), (A3), (A4), (A5), and water, and also optionally of (A2) and/or (A6) and/or (A7) and/or (A8) and/or of organic solvents, add up preferably to 100 wt %, based on the total weight of the coating composition (A).

The aqueous coating composition (A) preferably has a solids content in the range from 5 to 45 wt %, more preferably in the range from 7.5 to 35 wt %, very preferably from 10 to 30 wt %, more preferably still in the range from 12.5 to 25 wt % or in the range from 15 to 30 wt % or in the range from 15 to 25 wt %, more particularly from 17 to 22 wt %, based in each case on the total weight of the aqueous coating composition (A). Methods for determining the solids content are known to the skilled person. The solids content is determined preferably according to DIN EN ISO 3251 (date: Jun. 1, 2008).

The aqueous coating composition (A) used in accordance with the invention is preferably an aqueous dispersion or solution, preferably an aqueous dispersion.

The coating composition (A) of the invention has a pH in a range from 4.0 to 6.5. The coating composition (A) used in accordance with the invention preferably has a pH in the range from 4.2 to 6.5, more particularly in the range from 4.4 to 6.5 or in the range from 4.6 to 6.5, especially preferably in the range from 4.8 to 6.4, most preferably in the range from 5.0 to 6.2 or 5.2 to 6.0 or 5.5 to 6.0. Methods for adjusting pH levels in aqueous compositions are known to the skilled person. The desired pH is preferably set by addition of at least one acid, more preferably at least one inorganic and/or at least one organic acid. Examples of suitable inorganic acids are hydrochloric acid, sulfuric acid, phosphoric acid and/or nitric acid. An example of a suitable organic acid is propionic acid, lactic acid, acetic acid and/or formic acid. Alternatively or additionally and also preferably it is possible as well to use the at least one component (A5) present in the coating composition (A) for adjusting the pH level, provided said component is suitable for the purpose, i.e., has for example at least one deprotonatable functional group such as a carboxyl group, for example.

Preferably the coating composition (A) of the invention is obtainable by

-   -   at least partly converting at least one water-insoluble bismuth         compound, by at least partial reaction of this compound with at         least one complexing agent (A5), into at least one water-soluble         bismuth compound (A3) in water, optionally in the presence of at         least one of components (A1), (A2) and also (A6) to (A8), to         give a mixture comprising at least components (A3) and (A5) and         optionally (A4) of the coating composition (A), and     -   optionally mixing the resulting mixture at least with component         (A1) and optionally with component (A2), optionally in the         presence of at least one of components (A6) to (A8), to give the         coating composition (A).

The water-insoluble bismuth compound used is preferably part of a pigment paste which comprises at least one pigment (A6).

The coating composition (A) of the invention is preferably obtainable without any need for separate preparation of an aqueous solution of component (A3). This saves on time and costs and obviates possible problems occurring in relation to the stability of the coating composition (A) on addition of any such aqueous solution of component (A3), particularly if the coating composition is used in a dip-coating bath for at least partly coating electrically conductive substrates. It is nevertheless also possible first to carry out separate preparation of an aqueous solution of components (A3) and (A5) and then to add this solution to a mixture comprising the remaining components of the coating composition (A), to give the coating composition (A).

The coating composition (A) comprises a total amount of at least 130 ppm of bismuth, based on the total weight of the coating composition (A).

The term “bismuth” particularly in relation to the total amount of bismuth in the coating composition (A) and in component (A3) and also, optionally, (A4) is understood in the sense of the present invention to refer preferably to bismuth atoms optionally with a charge, such as positively charged cationic bismuth atoms, for example, of different valences. The bismuth in this case may be in trivalent form (Bi(III)), but alternatively or additionally may also be present in other oxidation states. The amount of bismuth is calculated as bismuth metal in each case.

The total amount of bismuth present in the coating composition (A) is preferably at least 150 ppm or at least 175 ppm or at least 200 ppm, more preferably at least 300 ppm, very preferably at least 500 or at least 750 ppm, more particularly at least 1000 ppm or at least 1500 ppm or at least 2000 ppm, based in each case on the total weight of the coating composition (A). The total amount of bismuth present in the coating composition (A) is preferably in each case not more than 20 000 ppm, more preferably not more than 15 000 ppm, very preferably not more than 10 000 ppm or not more than 7500 ppm, more particularly not more than 5000 ppm or not more than 4000 ppm, based in each case on the total weight of the coating composition (A). The total amount of bismuth present in the coating composition (A), based on the total weight of the aqueous coating composition (A), is preferably in a range from 10 ppm to 20 000 ppm, more preferably in a range from 50 ppm to 15 000 ppm, very preferably in a range from 100 ppm to 10 000 ppm, especially preferably in a range from 500 ppm to 10 000 ppm or in a range from 500 to 20 000 ppm or in a range from 1000 ppm to 10 000 ppm or in a range from 1000 ppm to 5000 ppm or in a range from 500 ppm to 3000 ppm. The total amount of bismuth present in the coating composition (A) is preferably in each case the sum total of (A3) and optionally present (A4). The amount of bismuth, calculated as metal, may be determined by means of the method (ICP-OES) hereinafter.

Component (A3)

The coating composition (A) of the invention comprises a total amount of at least 130 ppm of bismuth, based on the total weight of the coating composition (A), including

-   (A3) at least 30 ppm of bismuth, based on the total weight of the     coating composition (A), in a form in which it is in solution in the     coating composition (A).

Components (A3) and (A5) are preferably in the form of a complex and/or salt of components (A3) and (A5) in the coating composition (A). The at least 30 ppm of bismuth present in a form in solution as component (A3) in the coating composition (A) are therefore preferably present together with component (A5) in the form of a bismuth compound in solution in the coating composition (A), more particularly in the form of at least one dissolved salt and/or of a complex of components (A3) and (A5). Alternatively and/or additionally, for example, component (A3) may also be in the form of hydrated trivalent bismuth.

As component (A3) there is preferably at least some trivalent bismuth. It may be in hydrated form and/or in the form of at least one dissolved salt and/or of a complex, in particular together with (A5).

The term “in a form present in solution” in connection with component (A3) of the coating composition (A) of the invention means preferably that component (A3) is present in a form in solution in the coating composition (A) at a coating-composition (A) temperature in a range from 18 to 40° C. Component (A3) is preferably water-soluble.

Component (A3) is preferably obtainable from at least one bismuth compound selected from the group consisting of oxides, basic oxides, hydroxides, carbonates, nitrates, basic nitrates, salicylates, and basic salicylates of bismuth, and also mixtures thereof. At least one such bismuth compound is at least partly reacted preferably in water in the presence of at least one complexing agent (A5), to give component (A3).

The coating composition (A) preferably comprises at least 50 ppm, more preferably at least 75 ppm, very preferably at least 100 ppm or at least 130 ppm or at least 200 ppm, more particularly at least 250 ppm of bismuth, based in each case on the total weight of the coating composition (A), as component (A3) in a form in solution in the coating composition (A). If the coating composition (A) additionally comprises at least 100 ppm of bismuth in the form of component (A4), then to the skilled person it is clear that (A) consequently contains a total amount of at least 150 ppm or 175 ppm or 200 ppm or 230 ppm or 300 ppm or 350 ppm, respectively, of bismuth, based in each case on the total weight of the coating composition (A). The amount of bismuth present in solution as component (A3) is calculated in each case as bismuth metal.

The fraction of component (A3) in the coating composition (A) may be determined by means of the method of determination hereinafter.

Optional Component (A4)

The coating composition (A) of the invention comprises a total amount of at least 130 ppm of bismuth, based on the total weight of the coating composition (A), including

-   (A4) optionally at least 100 ppm of bismuth, based on the total     weight of the coating composition (A), in a form in which it is not     in solution in the coating composition (A).

In one preferred embodiment the coating composition (A) contains no optional component (A4), i.e., it contains no bismuth in a form in which it is not in solution in (A), and it therefore contains a total amount of at least 130 ppm of bismuth, based on the total weight of the coating composition (A), of which at least 130 ppm of bismuth, based on the total weight of the coating composition (A), are present in a form in which it is in solution in the coating composition (A).

In another preferred embodiment, however, the coating composition (A) does comprise component (A4), i.e., it comprises a total amount of at least 130 ppm of bismuth, based on the total weight of the coating composition (A), including

-   (A4) at least 100 ppm of bismuth, based on the total weight of the     coating composition (A), in a form in which it is not in solution in     the coating composition (A).

The at least 100 ppm of bismuth which are optionally present in a form not in solution as component (A4) in the coating composition (A) are present preferably in the form of a bismuth compound which is not in solution in the coating composition (A), more particularly in the form of at least one undissolved bismuth salt, hydroxide and/or oxide.

The fraction of component (A4) optionally present within the total amount of the bismuth present in the coating composition (A), i.e., based on the total amount of the bismuth present in the coating composition (A) in moles, is preferably at least 10 mol %, more preferably at least 20 mol %, or at least 30 mol %, very preferably at least 40 mol % or at least 50 mol % or at least 60 mol % or at least 70 mol %. The fraction of component (A4) optionally present within the total amount of the bismuth present in the coating composition (A) is preferably in each case not more than 98 mol %, very preferably not more than 97 mol % or not more than 96 mol %, especially preferably not more than 95 mol %.

The mol % fraction of component (A4) optionally present within the total amount of bismuth present in the coating composition (A) is preferably greater than the mol % fraction of component (A3).

The term “present in a form not in solution” in connection with the optionally present component (A4) of the coating composition (A) of the invention means preferably that the optionally present component (A4) is present in a form not in solution in the coating composition (A) at a coating-composition (A) temperature in a range from 18 to 40° C. The optionally present component (A4) is preferably water-insoluble.

The optionally present component (A4) is preferably obtainable from at least one bismuth compound selected from the group consisting of oxides, basic oxides, hydroxides, carbonates, basic nitrates (subnitrates), salicylates, and basic salicylates (subsalicylates) of bismuth, and also mixtures thereof, more preferably obtainable from bismuth subnitrate.

Where the coating composition (A) comprises component (A4), i.e., at least 100 ppm of bismuth, based on the total weight of the coating composition (A), in a form in which it is not in solution in the coating composition (A), the coating composition (A) preferably comprises at least 150 ppm, more preferably at least 200 ppm, very preferably at least 250 ppm or at least 300 ppm, more particularly at least 500 ppm of bismuth, based in each case on the total weight of the coating composition (A), in a form in which it is not in solution in the coating composition (A), as component (A4). To the skilled person it is clear that the coating composition (A) consequently comprises a total amount of at least 180 ppm or at least 230 ppm or at least 280 ppm or at least 330 ppm or at least 530 ppm, respectively, of bismuth, based in each case on the total weight of the coating composition (A). In any case, the coating composition in the form of component (A3) contains at least 30 ppm of bismuth. The amount of bismuth present not in solution, as optionally present component (A4), is calculated in each case as bismuth metal.

The fraction of component (A4) optionally present in the coating composition (A) may be determined by means of the method of determination hereinafter.

Preferably the coating composition (A) comprises a total amount of at least 300 ppm of bismuth, based on the total weight of the coating composition (A), including

-   (A3) at least 100 ppm or at least 300 ppm of bismuth, based on the     total weight of the coating composition (A), in a form in which it     is in solution in the coating composition (A), and -   (A4) optionally at least 200 ppm of bismuth, based on the total     weight of the coating composition (A), in a form in which it is not     in solution in the coating composition (A).

More preferably the coating composition (A) comprises a total amount of at least 400 ppm of bismuth, based on the total weight of the coating composition (A), including

-   (A3) at least 150 ppm or at least 400 ppm of bismuth, based on the     total weight of the coating composition (A), in a form in which it     is in solution in the coating composition (A), and -   (A4) optionally at least 250 ppm of bismuth, based on the total     weight of the coating composition (A), in a form in which it is not     in solution in the coating composition (A).

Very preferably the coating composition (A) comprises a total amount of at least 500 ppm of bismuth, based on the total weight of the coating composition (A), including

-   (A3) at least 200 ppm or at least 500 ppm of bismuth, based on the     total weight of the coating composition (A), in a form in which it     is in solution in the coating composition (A), and -   (A4) optionally at least 300 ppm of bismuth, based on the total     weight of the coating composition (A), in a form in which it is not     in solution in the coating composition (A).     Component (A5)

The coating composition (A) of the invention comprises at least one at least bidentate complexing agent suitable for complexing bismuth, as component (A5).

The at least one complexing agent (A5) is preferably present in the aqueous coating composition (A) in a fraction of at least 5 mol %, based on the total amount of bismuth present in the coating composition (A). In the aqueous coating composition (A), the at least one complexing agent (A5) is present very preferably in a fraction of at least 7.5 mol % or at least 10 mol %, more preferably in a fraction of at least 15 mol % or at least 20 mol %, very preferably in a fraction of at least 30 mol % or at least 40 mol %, more particularly in a fraction of at least 50 mol %, based in each case on the total amount of bismuth present in the coating composition (A). With more particular preference the at least one complexing agent (A5) is present in the aqueous coating composition (A) in a fraction of at least 75 mol % or at least 100 mol %, more preferably in a fraction of at least 200 mol % or at least 300 mol %, very preferably in a fraction of at least 500 mol %, more particularly in a fraction of at least 700 mol %, based in each case on the total amount of bismuth present in the coating composition (A).

Component (A5) here is suitable for complexing both (A3) and also optionally present (A4). As a result of the presence of component (A5) in the coating composition (A), preferably, component (A4)—if present—is converted partly into component (A3). Preferably, therefore, the at least one complexing agent (A5) is suitable for forming salts and/or complexes with component (A3) present in the aqueous coating composition (A).

Particularly suitable as component (A5) are complexing agents which are capable of converting optionally present component (A4) in water into a water-soluble form (A3), preferably at temperatures in the range from to 90° C. or in the range from 20 to 80° C., more preferably in the range from 30 to 75° C.

The complexing agent (A5) is preferably not a binder component (A1) and in particular is also not used for preparing the binder (A1).

The complexing agent (A5) is at least bidentate. A skilled person knows of the concept of “denticity”. The term refers to the number of possible bonds which can be formed by a molecule of complexing agent (A5) to the atom that is to be complexed, such as to the bismuth ion and/or bismuth atom that is to be complexed.

The at least one at least bidentate complexing agent suitable for complexing bismuth, as component (A5), is a compound of the general formula (1) or an anion of said compound

in which R¹ is a C₁₋₆ aliphatic radical substituted by at least one OH group, m is 0 or 1, R^(a) and R^(b) in each case independently of one another are selected from the group consisting of H and C₁₋₆ aliphatic radicals, optionally substituted by at least one OH group, R², R³, R⁴, and R⁵ in each case independently of one another are H or are a C₁₋₆ aliphatic radical optionally substituted by at least one OH group, n is 1 or 2, o is 1 or 2, p is 0, 1, 2, or 3, and

-   R⁶ is C(═O)OH, S(═O)₂OH, P(═O)(OH)₂, NR⁷R⁸, or a C₁₋₆ aliphatic     radical which is substituted by at least one OH group,     -   where R⁷ and R⁸ in each case independently of one another are         selected from the group consisting of H and C₁₋₆ aliphatic         radicals which are optionally substituted by at least one OH         group,     -   with the proviso that at least one of the radicals R⁷ and R⁸ is         a C₁₋₆ aliphatic radical which is substituted by at least one OH         group.

The expression “C₁₋₆ aliphatic radical” in the sense of this invention encompasses preferably acyclic saturated or unsaturated, preferably saturated, aliphatic hydrocarbon radicals, i.e., C₁₋₆ aliphatic radicals which may each be branched or unbranched and also unsubstituted or, optionally, substituted at least singly, as for example doubly or triply, but preferably singly, by at least one, optionally also two or three, OH group(s), and having 1 to 6, i.e., 1, 2, 3, 4, 5, or 6, carbon atoms, i.e., C₁₋₆ alkanyls, C₂₋₆ alkenyls, and C₂₋₆ alkynyls. Alkenyls here have at least one C—C double bond, and alkynyls here have at least one C—C triple bond. More preferably a C₁₋₆ aliphatic radical is a C₁₋₆ alkanyl. Preferably a C₁₋₆ aliphatic radical is selected from the group encompassing methyl, ethyl, n-propyl, 2-propyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, isopentyl, neopentyl, and n-hexyl. Particularly preferred is a C₁₋₆ aliphatic radical selected from the group encompassing ethyl, n-propyl, 2-propyl, n-butyl, isobutyl, and sec-butyl, more particularly ethyl, n-propyl, and 2-propyl. A C₁₋₄ aliphatic radical corresponds in the sense of the present invention to a C₁₋₆ aliphatic radical and to the preferred embodiments specified above for such a radical, with the difference that a C₁₋₄ aliphatic radical of this kind has only 1 to 4 carbon atoms, i.e., 1, 2, 3, or 4 carbon atoms.

If R¹ is a C₁₋₆ aliphatic radical substituted by at least one OH group and m is 0, then the at least one OH group is preferably in α-, β-, or γ-position, more preferably β-position, to the nitrogen atom to which R¹ is bonded.

If R¹ is a C₁₋₆ aliphatic radical substituted by at least one OH group and m is 1, then the at least one OH group is preferably in α-, β-, or γ-position, more preferably α-position, to the carbon atom to which R¹ is bonded.

If R⁶ is a C₁₋₆ aliphatic radical substituted by at least one OH group, then the at least one OH group is preferably in α-, β-, or γ-position, more preferably 3-position, to the nitrogen atom to which R⁶ is bonded.

If R^(a) and/or R^(b) is a C₁₋₆ aliphatic radical substituted by at least one OH group, then the at least one OH group is preferably in α-, β-, or γ-position, more preferably α-position, to the carbon atom to which R^(a) and R^(b) are bonded.

If R² and/or R⁴ is a C₁₋₆ aliphatic radical substituted by at least one OH group, then the at least one OH group is preferably in α-, β-, or γ-position, more preferably β-position, to the nitrogen atom to which R² and/or R⁴ are bonded.

If R³ and/or R⁵ is a C₁₋₆ aliphatic radical substituted by at least one OH group, then the at least one OH group is preferably in α-, β-, or γ-position, more preferably β-position, to the carbon atom to which R³ and/or R⁵ are bonded.

Preferably

-   -   R⁶ is C(═O)OH or is NR⁷R⁸ or is a C₁₋₆ aliphatic radical which         is substituted by at least one OH group.

Preferably m is 0.

Preferably n and o, more particularly n, are in each case independently 1 if R⁶ is C(═O)OH, especially if, also, p is 0. Preferably n and o, more particularly n, are in each case independently 2 if R⁶ is NR⁷R⁸ or is a C₁₋₆ aliphatic radical which is substituted by at least one OH group, especially if, also, p is 0.

Preferably

-   -   R¹ is a C₁₋₄ aliphatic radical substituted by at least one OH         group,     -   m is 0 or 1,     -   R^(a) and R^(b) are each independently of one another selected         from the group consisting of H and C₁₋₄ aliphatic radicals,         optionally substituted by at least one OH group,     -   R², R³, R⁴, and R⁵ are each independently of one another H or a         C₁₋₄ aliphatic radical which is optionally substituted by at         least one OH group,     -   n is 1 or 2,     -   o is 1 or 2,     -   p is 0, 1, or 2, and     -   R⁶ is C(═O)OH, NR⁷R⁸, or a C₁₋₄ aliphatic radical which is         substituted by at least one OH group,         -   where R⁷ and R⁸ each independently of one another are             selected from the group consisting of H and C₁₋₄ aliphatic             radicals which are optionally substituted by at least one OH             group,         -   with the proviso that at least one of the radicals R⁷ and R⁸             is a C₁₋₄ aliphatic radical which is substituted by at least             one OH group.

If N,N′-bis(2-hydroxyethyl)glycine is used as complexing agent (A5), it is present in the aqueous coating composition (A) preferably in a fraction in a range of <900 mol %, more preferably in a range from 100 to 700 mol %, based in each case on the total amount of bismuth present in the coating composition (A). If N,N,N′,N′-tetrakis-2-hydroxyethylethylenediamine is used as complexing agent (A5), it is present in the aqueous coating composition (A) preferably in a fraction in a range from 100 to 600 mol %, based in each case on the total amount of bismuth present in the coating composition (A). If N,N,N′,N′-tetrakis-2-hydroxypropylethylenediamine is used as complexing agent (A5), it is present in the aqueous coating composition (A) preferably in a fraction in a range from 50 to 300 mol %, based in each case on the total amount of bismuth present in the coating composition (A).

The inventively employed complexing agent (A5) may therefore have at most one carboxyl group and at most two amino groups. The inventively employed complexing agent (A5) is therefore not an aminopolycarboxylic acid.

The term “aminopolycarboxylic acid” in the sense of the present invention refers preferably to a carboxylic acid which has two or more carboxyl groups, as for example 2, 3, 4, 5, or 6 carboxyl groups, and also has at least one amino group, as for example at least one primary and/or secondary and/or tertiary amino group, more particularly at least one or at least two tertiary amino groups. Such aminopolycarboxylic acids have, for example, 2 to 64 carbon atoms or 2 to 36 or 3 to 18 or 3 to 8 carbon atoms. Examples of aminopolycarboxylic acids are ethylenediaminetetraacetic acid (EDTA), diethylenetriaminepentaacetic acid (DTPA), nitrilotriacetic acid (NTA), aspartic acid, methylglycidinediacetic acid (MGDA), β-alaninediacetic acid (β-ADA), imidosuccinate (IDS), hydroxyethyleneiminodiacetate (HEIDA), and N-(2-hydroxyethyl)ethylenediamine-N,N,N′-triacetic acid (HEDTA).

The molar fraction of any at least one amino polycarboxylic acid present in the aqueous coating composition (A), more particularly of aminopolycarboxylic acid used as component (A5), is preferably lower by a factor of at least 15 or 20, more preferably by a factor of at least 30 or 40 or 50 or 60 or 70 or 80 or 90 or 100 or 1000, than the total amount of bismuth present in the aqueous coating composition (A), in moles, preferably based in each case on the total weight of the aqueous composition (A). The presence of such acids may possibly lead to problems with dipping bath stability and with wastewater treatment, as a result of accumulation of these compounds within the dipping bath.

Further Optional Components of the Coating Composition (A)

Depending on desired application, moreover, the aqueous coating composition (A) used in accordance with the invention may comprise at least one pigment (A6).

A pigment (A6) of this kind, present in the aqueous coating composition (A), is preferably selected from the group consisting of organic and inorganic, color-imparting and extending pigments.

This at least one pigment (A6) may be present as part of the aqueous solution or dispersion which is used for preparing the coating composition (A) and which comprises the components (A1) and optionally (A2).

The at least one pigment (A6) may alternatively be incorporated into the coating composition (A), in the form of a further aqueous dispersion or solution, different from the one used. In this embodiment, the corresponding pigment-containing aqueous dispersion or solution may further comprise at least one binder. A dispersion or solution of this kind preferably further comprises component (A4).

Examples of suitable inorganic color-imparting pigments (A6) are white pigments such as zinc oxide, zinc sulfide, titanium dioxide, antimony oxide, or lithopone; black pigments such as carbon black, iron manganese black, or spinel black; chromatic pigments such as cobalt green or ultramarine green, cobalt blue, ultramarine blue or manganese blue, ultramarine violet or cobalt violet and manganese violet, red iron oxide, molybdate red, or ultramarine red; brown iron oxide, mixed brown, spinel phases and corundum phases; or yellow iron oxide, nickel titanium yellow, or bismuth vanadate. Examples of suitable organic color-imparting pigments are monoazo pigments, disazo pigments, anthraquinone pigments, benzimidazole pigments, quinacridone pigments, quinophthalone pigments, diketopyrrolopyrrole pigments, dioxazine pigments, indanthrone pigments, isoindoline pigments, isoindolinone pigments, azomethine pigments, thioindigo pigments, metal complex pigments, perinone pigments, perylene pigments, phthalocyanine pigments, or aniline black. Examples of suitable extending pigments or fillers are chalk, calcium sulfate, barium sulfate, silicates such as talc or kaolin, silicas, oxides such as aluminum hydroxide or magnesium hydroxide, or organic fillers such as textile fibers, cellulose fibers, polyethylene fibers, or polymer powders; for further details, refer to Römpp Lexikon Lacke und Druckfarben, Georg Thieme Verlag, 1998, pages 250 ff., “Fillers”.

The pigment content of the aqueous coating compositions (A) may vary according to intended use and according to the nature of pigments (A6). The amount, based in each case on the total weight of the aqueous coating composition (A), is preferably in the range from 0.1 to 30 wt % or in the range from 0.5 to 20 wt %, more preferably in the range from 1.0 to 15 wt %, very preferably in the range from 1.5 to 10 wt %, and more particularly in the range from 2.0 to 5.0 wt %, or in the range from 2.0 to 4.0 wt %, or in the range from 2.0 to 3.5 wt %.

Depending on desired application, the coating composition (A) may comprise one or more typically employed additives (A7). These additives (A7) are preferably selected from the group consisting of wetting agents, emulsifiers, which preferably do not contain component (A8), dispersants, surface-active compounds such as surfactants, flow control assistants, solubilizers, defoamers, rheological assistants, antioxidants, stabilizers, preferably heat stabilizers, in-process stabilizers, and UV and/or light stabilizers, catalysts, fillers, waxes, flexibilizers, plasticizers, and mixtures of the abovementioned additives. The additive content may vary very widely according to intensive use. The amount, based on the total weight of the aqueous coating composition (A), is preferably 0.1 to 20.0 wt %, more preferably 0.1 to 15.0 wt %, very preferably 0.1 to 10.0 wt %, especially preferably 0.1 to 5.0 wt %, and more particularly 0.1 to 2.5 wt %.

The at least one additive (A7) here may be present as part of the aqueous solution or dispersion which is used in preparing the coating composition (A) and which comprises the components (A1) and optionally (A2).

Alternatively the at least one additive (A7) may also be incorporated into the coating composition (A), in the form of a further aqueous dispersion or solution different from the one used, as for example within an aqueous dispersion or solution which comprises at least one pigment (A6) and optionally, moreover, at least one binder and optionally, moreover, (A4).

In one preferred embodiment, the coating composition (A) used in accordance with the invention is a cathodically depositable mini emulsion which comprises at least one cationic emulsifier (A8). The term “mini emulsion” is familiar to the skilled person, from I. M. Grabs et al., Macromol. Symp. 2009, 275-276, pages 133-141, for example. A mini emulsion, accordingly, is an emulsion whose particles have an average size in the range from 5 to 500 nm. Methods for determining the average size of such particles are familiar to the skilled person. Such determination of average particle size takes place preferably by dynamic light scattering in accordance with DIN ISO 13321 (date: Oct. 1, 2004). Mini emulsions of these kinds are known from WO 82/00148 A1, for example. The at least one cationic emulsifier is preferably an emulsifier which has an HLB of ≥8, this being determined preferably by the method of Griffin, which is known to the skilled person. The emulsifier may have reactive functional groups. Such reactive functional groups contemplated are the same reactive functional groups which the binder (A1) may have as well. The emulsifier preferably has a hydrophilic head group, which preferably has a quaternary nitrogen atom bonded to which are four organic, preferably aliphatic radicals, such as organic radicals having 1-10 carbon atoms, for example, and a lipophilic tail group. At least one of these organic radicals preferably has a hydroxyl group.

Optional Further Metal Ions in (A)

The molar fraction of zirconium ions optionally present in the aqueous coating composition (A) is preferably lower by a factor of at least 100, preferably at least 200, more preferably at least 300 or 400 or 500 or 600 or 700 or 800 or 900 or 1000, than the total amount in moles of bismuth present in the aqueous coating composition (A), preferably based in each case on the total weight of the aqueous composition (A). With more particular preference the coating composition (A) contains no zirconium ions.

Zirconium compounds employed typically in coating compositions for improving the corrosion prevention are often used in the form of salts or acids which contain zirconium ions, more particularly [ZrF₆]²⁻ ions. When bismuth ions are present at the same time, however, the use of such [ZrF₆]²⁻ ions results in precipitation of bismuth fluoride. The use of zirconium compounds in the coating composition (A) is therefore to be avoided.

Preferably, moreover, the molar fraction of ions optionally present in the aqueous coating composition (A) and selected from the group consisting of ions of rare earth metals is lower by a factor of at least 100, very preferably by a factor of at least 200 or 300 or 400 or 500 or 600 or 700 or 800 or 900 or 1000, than the total amount in moles of bismuth present in the aqueous coating composition (A), preferably based in each case on the total weight of the aqueous composition (A). More particularly the coating composition (A) contains no ions of rare earth metals. The presence of such ions makes the method of the invention more expensive and makes wastewater treatment more difficult. Such ions of rare earth metals are preferably selected form the group consisting of ions of Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gb, Td, Dy, Ho, Er, Tm, Yb, and Lu.

Method for Producing the Coating Composition (A)

A further subject of the present invention is a method for producing the aqueous coating composition (A) of the invention, which method comprises at least the step (0):

-   -   (0) at least partly converting at least one water-insoluble         bismuth compound, more preferably at least one compound selected         from the group consisting of oxides, basic oxides, hydroxides,         carbonates, nitrates, basic nitrates, salicylates, and basic         salicylates of bismuth, and also mixtures thereof, by at least         partial reaction of this compound with at least one at least         bidentate complexing agent (A5) suitable for complexing bismuth,         into at least one water-soluble bismuth compound (A3),         optionally in the presence of at least one of components (A6) to         (A8) and optionally (A1) and/or (A2), in water, to give a         mixture comprising at least components (A3) and (A5), optionally         (A4) and also, optionally, (A1) and/or (A2), of the coating         composition (A1).

The water-insoluble bismuth compound is preferably part of a pigment paste which comprises at least one pigment (A6).

After step (0) has been carried out, the method of the invention optionally comprises at least one further step, as follows:

-   -   mixing the mixture obtained after step (0) has been carried out,         at least with component (A1) and optionally with component (A2)         and also, optionally, with at least one of components (A6) to         (A8), to give the coating composition (A).

The duration of step (0) is preferably at least 2 or at least 4 or at least 6 or at least 8 or at least 10 or at least 12 or at least 14 or at least 16 or at least 18 or at least 20 or at least 22 or at least 24 hours. Step (0) is carried out preferably with stirring at a temperature in the range from 18 to 23° C.

The coating composition (A) of the invention is preferably obtainable without any need for separate preparation of an aqueous solution of component (A3). This saves on time and cost and on possible problems occurring in relation to the stability of the coating composition (A) on addition of any such aqueous solution of component (A3), especially if the coating composition is used in a dip-coating bath for at least partly coating electrically conductive substrates.

All preferred embodiments described hereinabove in connection with the aqueous coating composition (A) of the invention are also preferred embodiments of the aqueous coating composition (A) used in accordance with the invention, in relation to its production.

Use of the Coating Composition (A)

A further subject of the present invention is a use of the coating composition (A) of the invention, or of the aqueous coating composition (A) used in the method of the invention for at least partly coating an electrically conductive substrate with an electrocoat material, for at least partly coating an electrically conductive substrate with an electrocoat material.

All preferred embodiments described hereinabove in connection with the aqueous coating composition (A) of the invention are also preferred embodiments of the aqueous coating composition (A) used in accordance with the invention, in relation to its use for at least partly coating an electrically conductive with an electrocoat material.

Method for at Least Partly Coating an Electrically Conductive Substrate with the Coating Composition (A)

A further subject of the present invention is a method for at least partly coating an electrically conductive substrate with an electrocoat material, comprising at least one step (1):

-   (1) contacting the electrically conductive substrate, connected as     cathode, with the aqueous coating composition (A) of the invention.

A further subject of the present invention is a method for at least partly coating an electrically conductive substrate with an electrocoat material, comprising at least one step (1):

-   (1) contacting the electrically conductive substrate, connected as     cathode, with the aqueous coating composition (A) of the invention,     step (1) being carried out in at least two successive stages (1a)     and (1b):     -   (1a) at an applied voltage in a range from 1 to 50 V, which is         preferably applied over a duration of at least 5 seconds, and     -   (1b) at an applied voltage in a range from 50 to 400 V, with the         proviso that the voltage applied in stage (1b) is greater by at         least 10 V than the voltage applied in stage (1a),         i.e., with an aqueous coating composition (A) comprising     -   (A1) at least one cathodically depositable binder and     -   (A2) optionally at least one crosslinking agent,         the coating compostion (A) having a pH in a range from 4.0 to         6.5,         wherein the coating composition (A) comprises a total amount of         at least 130 ppm of bismuth, based on the total weight of the         coating composition (A), including     -   (A3) at least 30 ppm of bismuth, based on the total weight of         the coating composition (A), in a form in which it is in         solution in the coating composition (A), and     -   (A4) optionally at least 100 ppm of bismuth, based on the total         weight of the coating composition (A), in a form in which it is         not in solution in the coating composition (A), and         the coating composition (A) further comprises     -   (A5) at least one at least bidentate complexing agent suitable         for complexing bismuth,         the at least one complexing agent (A5) being a compound of the         general formula (1) or an anion of said compound

in which R¹ is a C₁₋₆ aliphatic radical substituted by at least one OH group, m is 0 or 1, R^(a) and R^(b) in each case independently of one another are selected from the group consisting of H and C₁₋₆ aliphatic radicals, optionally substituted by at least one OH group, R², R³, R⁴, and R⁵ in each case independently of one another are H or are a C₁₋₆ aliphatic radical optionally substituted by at least one OH group, n is 1 or 2, o is 1 or 2, p is 0, 1, 2, or 3, and

-   R⁶ is C(═O)OH, S(═O)₂OH, P(═O)(OH)₂, NR⁷R⁸, or a C₁₋₆ aliphatic     radical which is substituted by at least one OH group,     -   where R⁷ and R⁸ in each case independently of one another are         selected from the group consisting of H and C₁₋₆ aliphatic         radicals which are optionally substituted by at least one OH         group,     -   with the proviso that at least one of the radicals R⁷ and R⁸ is         a C₁₋₆ aliphatic radical which is substituted by at least one OH         group.

All preferred embodiments described hereinabove in connection with the aqueous coating composition (A) of the invention are also preferred embodiments of the aqueous coating composition (A) used in accordance with the invention, in relation to its use in step (1) of the method of the invention for at least partly coating an electrically conductive substrate with an electrocoat material.

Step (1)

The method of the invention for at least partly coating an electrically conductive substrate with an electrocoat material comprises at least one step (1), this being a contacting of the electrically conductive substrate connected as cathode with the aqueous coating composition (A).

“Contacting” in the sense of the present invention refers preferably to the immersing of the substrate, intended for at least partial coating with the coating composition (A), into the aqueous coating composition (A) used, the spraying of the substrate intended for at least partial coating with the coating composition (A), or the roll of application to the substrate intended for at least partial coating with the coating composition (A). More particularly, the term “contacting” in the sense of the present invention refers to immersing of the substrate intended for at least partial coating with the coating composition (A) into the aqueous coating composition (A) used.

The method of the invention is preferably a method for at least partly coating an electrically conductive substrate used in and/or for automobile construction. The method may take place continuously in the form of a strip coating operation, such as in the coil coating process, for example, or discontinuously.

With step (1) of the method of the invention, the substrate is at least partly coated with the aqueous coating composition (A) of the invention by cataphoretic deposition of this coating composition on the substrate surface.

Step (1) is accomplished by applying an electrical voltage between the substrate and at least one counterelectrode. Step (1) of the method of the invention is carried out preferably in a dip-coating bath. The counterelectrode may in this case be located in the dip-coating bath. Alternatively or additionally, the counterelectrode may also be present separately from the dip-coating bath, for example via an anionic exchange membrane which is permeable for anions. In this case, anions formed during dip coating are transported from the coating material through the membrane into the anolyte, allowing the pH in the dip-coating bath to be regulated or kept constant. The counterelectrode is preferably separate from the dip-coating bath.

In step (1) of the method of the invention, preferably, there is full coating of the substrate with the aqueous coating composition (A) of the invention, by complete cataphoretic deposition on the entire substrate surface.

Preferably, in step (1) of the method of the invention, a substrate intended for at least partial coating is introduced at least partly, preferably completely, into a dip-coating bath, and step (1) is carried out within this dip-coating bath.

The aim in step (1) of the method of the inventions is at least partial coating of the substrate by an at least partial cataphoretic deposition of the aqueous coating composition (A). The aqueous coating composition (A) of the invention in this case is deposited as electrocoat material on the substrate surface.

The aqueous coating composition (A) of the invention is preferably contacted with an electrically conducting anode and with the electrically conductive substrate connected as cathode. Alternatively, the aqueous coating composition (A) does not have to be brought directly into contact with an electrically conducting anode, if the anode, for example, is present separately from the dip-coating bath, as for example via an anion exchange membrane which is permeable for anions.

The passage of electrical current between anode and cathode is accompanied by deposition of a firmly adhering paint film on the cathode, i.e., on the substrate.

Step (1) of the method of the invention is carried out preferably at a dip bath temperature in a range from 20 to 45° C., more preferably in a range from 22 to 42° C., very preferably in a range from 24 to 41° C., especially preferably in a range from 26 to 40° C., with more particular preference in a range from 27 to 39° C., such as in a range from 28 to 38° C., for example. In another preferred embodiment of the method of the invention, step (1) is carried out at a dip bath temperature of not more than 40° C., more preferably not more than 38° C., very preferably not more than 35° C., especially preferably not more than 34° C. or not more than 33° C. or not more than 32° C. or not more than 31° C. or not more than 30° C. or not more than 29° C. or not more than 28° C. In a further, different preferred embodiment of the method of the invention, step (1) is carried out at a dip bath temperature ≤32° C. such as, for example, ≤31° C. or ≤30° C. or ≤29° C. or ≤28° C. or ≤27° C. or ≤26° C. or ≤25° C. or ≤24° C. or ≤23° C.

In step (1) of the method of the invention, the aqueous coating composition (A) of the invention is preferably applied such that the resulting electrocoat film has a dry film thickness in the range from 5 to 40 μm, more preferably from 10 to 30 μm, especially preferably from 20 to 25 μm.

Stages (1a) and (1b) within Step (1)

Step (1) of the method of the invention is carried out in at least two successive stages (1a) and (1b) as follows:

-   -   (1a) at an applied voltage in a range from 1 to 50 V, which is         applied over a duration of at least 5 seconds, and     -   (1b) at an applied voltage in a range from 50 to 400 V, with the         proviso that the voltage applied in stage (1b) is greater by at         least 10 V than the voltage applied in stage (1a).

Stages (1a) and (1b) within step (1) of the method of the invention are carried out preferably within a dip-coating bath that is used, comprising the coating composition (A).

Stage (1a)

During the implementation of stage (1a), a corresponding bismuth-enriched layer is formed as a preliminary deposition layer on the electrically conductive substrate, this being detectable and quantifiable by X-ray fluorescence analysis, for example. The bismuth here is preferably in the form of metallic bismuth(0), but alternatively or additionally may also be present in trivalent form and/or in other oxidation states. This preliminary deposition layer is, in particular, largely free of components (A1) and optionally (A2) and/or (A5) and/or (A6) present in the coating composition. The bismuth-enriched layer formed accordingly preferably exerts a corrosion-preventing effect, the pronouncedness of this effect rising in line with the bismuth layer add-on (in mg of bismuth per m² of surface area). Preferred layer add-ons are at least 10 or at least 20 or at least 30, more preferably at least 40 or at least 50, and more particularly at least 100 or at least 180, mg of bismuth (calculated as metal) per m² of surface area.

Stage (1a) is carried out preferably with an applied voltage in a range from 1 to 45 V or in a range from 1 to 40 V or in a range from 1 to 35 V or in a range from 1 to 30 V or in a range from 1 to 25 V or in a range from 1 to 20 V or in a range from 1 to 15 V or in a range from 1 to 10 V or in a range from 1 to 5 V. In another preferred embodiment, stage (1a) is carried out with an applied voltage in a range from 2 to 45 V or in a range from 2 to 40 V or in a range from 2 to 35 V or in a range from 2 to 30 V or in a range from 3 to 25 V or in a range from 3 to 20 V or in a range from 3 to 15 V or in a range from 3 to 10 V or in a range from 3 to 6 V.

The voltage applied in stage (1a) is applied over a duration of at least 5 seconds, preferably of at least 10 or at least 15 or at least 20 or at least 25 or at least 30 or at least 40 or at least 50 seconds, more preferably of at least 60 or at least 70 or at least 80 or at least 90 or at least 100 seconds, very preferably of at least 110 or at least 120 seconds. The duration here is preferably not more than 300 seconds, more preferably not more than 250 seconds, and more particularly not more than 150 seconds. This duration designates in each case the interval of time during which the voltage in question is maintained during the implementation of stage (1a).

In one preferred embodiment, the voltage applied in stage (1a) is applied over a duration in a range from at least 5 to 500 seconds or from 5 to 500 seconds or from 10 to 500 seconds or from 10 to 300 seconds or from at least 20 to 400 seconds or from at least 30 to 300 seconds or from at least 40 to 250 seconds or from at least 50 to 200 seconds, more preferably in a range from at least 60 to 150 seconds or from at least 70 to 140 seconds or from at least 80 to 130 seconds.

A voltage in a range from 1 to 50 V which is applied during the implementation of stage (1a) over a duration of at least 10 seconds may be set galvanostatically (constantly regulated current). Alternatively, this setting may also be accomplished potentiostatically (constantly regulated voltage), however, with stage (1a) being carried out at a deposition current or in a deposition current range that corresponds to a corresponding voltage in a range from 1 to 50 V. A deposition current of this kind is preferably in a range from 20 to 400 mA, more preferably in a range from 30 to 300 mA or in a range from 40 to 250 mA or in a range from 50 to 220 mA, more particularly in a range from 55 to 200 mA. Such deposition currents within stage (1a) are used preferably when employing substrates which have a surface area in the range from 300 to 500 cm², more particularly from 350 to 450 cm² or 395 to 405 cm².

The deposition current density in stage (1a) is preferably at least 1 A/m², more preferably at least 2 A/m², and more particularly at least 3 A/m², but preferably in each case not more than 20 A/m², more preferably in each case not more than 10 A/m².

The deposition current density or the deposition current in stage (1a) here is applied preferably over a duration of at least 5 or at least 10 seconds, preferably at least 15 or at least 20 or at least 25 or at least 30 or at least 40 or at least 50 seconds, more preferably at least 60 or at least 70 or at least 80 or at least 90 or at least 100 seconds, very preferably at least 110 or at least 120 seconds. The duration here is preferably not more than 300 seconds, more preferably not more than 250 seconds, and more particularly not more than 150 seconds. In another preferred embodiment, the deposition current density or deposition current applied in stage (1a) is applied over a duration in a range from at least 10 to 500 seconds or from at least 20 to 400 seconds or from at least 30 to 300 seconds or from at least 40 to 250 seconds or from at least 50 to 200 seconds, more preferably in a range from at least 60 to 150 seconds or from at least 70 to 140 seconds or from at least 80 to 130 seconds.

The voltage or the deposition current or the deposition current density may be kept constant here during the stated duration. Alternatively, however, the voltage or the deposition current or the deposition current density may adopt different values during the deposition duration within stage (1a), within the stated minimum and maximum values in the range from 1 to 50 V—for example, it may swing back and forth or rise in ramp or step form from the minimum to the maximum deposition voltage.

The setting of the voltage or of the deposition current or deposition current density during the implementation of stage (1a) may take place “suddenly”, in other words, for example, by appropriately switching over to a rectifier, this requiring a certain technically related minimum period of time in order to attain the target voltage. Alternatively, setting may take place in the form of a ramp, in other words at least approximately continuously and preferably linearly over a selectable period, as for example a period of up to 10, 20, 30, 40, 50, 60, 120, or 300 seconds. Preferred is a ramp of up to 120 seconds, more preferably of up to 60 seconds. A steplike voltage increase is also possible here, in which case preferably a certain hold time at the voltage is observed for each of these voltage stages, of 1, 5, 10, or 20 seconds, for example. Also possible is a combination of ramps and steps.

The setting of the voltage or of the deposition current or deposition current density in stage (1a) may also be regulated in the form of pulses, with times without current or with a voltage below the minimum level between two pulses. The pulse duration may be situated, for example, in the range from 0.1 to 10 seconds. The “period” for the deposition is then considered, preferably, to be the sum total of the durations for which the deposition voltage lies within the aforementioned maximum and minimum values when implementing step (1a). Ramps and pulses may also be combined with one another.

During the implementation of stage (1a), the complexing agent (A5) is preferably liberated again at least partly, more particularly completely, since the component (A3) complexed by (A5) is deposited. In view of an optional presence of component (A4) in the coating composition (A), the liberated complexing agent (A5) may be utilized, in such presence of component (A4), in order to convert component (A4) at least partly into a form in solution in (A)—that is (A5) may be used for the continual generation of (A3), in order to ensure the presence of an appropriate reservoir of (A3).

Stage (1b)

During the implementation of stage (1b), the actual dip varnish coating is formed on the preliminary deposition layer obtained after step (1a), by deposition of the dip varnish components, more particularly (A1) and optionally (A2) and/or (A5). This coating as well comprises bismuth, which may be present in trivalent form or alternatively or additionally in other oxidation states. This bismuth may act as catalyst in a downstream optional curing step or crosslinking step (6) of the method of the invention. In the production of the coating composition (A), accordingly, it is possible with preference to forgo the incorporation of such a catalyst.

Stage (1b) is preferably carried out at an applied voltage in a range from 55 to 400 V or in a range from 75 to 400 V or in a range from 95 to 400 V or in a range from 115 to 390 V or in a range from 135 to 370 V or in a range from 155 to 350 V or in a range from 175 to 330 V or in a range from 195 to 310 V or in a range from 215 to 290 V.

In stage (1b), preferably, in a time interval in the range from 0 to 300 seconds after the end of the implementation of stage (1a), a voltage in the range from 50 to 400 V is applied, preferably relative to an inert counterelectrode, but with the proviso that this voltage applied in stage (1b) is greater by at least 10 V than the voltage applied before in stage (1a). Within the implementation of stage (1b), this voltage is preferably maintained for a time in the range from 10 to 300 seconds, preferably in the range from 30 to 240 seconds, at not less than a value within the stated voltage range from 50 to 400 V, subject to the proviso stated above.

The voltage applied in stage (1b) is preferably applied over a duration of at least 10 seconds or at least 15 or at least 20 or at least 25 or at least 30 or at least 40 or at least 50 seconds, more preferably of at least 60 or at least 70 or at least 80 or at least 90 or at least 100 seconds, very preferably of at least 110 or at least 120 seconds. The duration here is preferably not more than 300 seconds, more preferably not more than 250 seconds, and more particularly not more than 150 seconds. This duration designates in each case the interval of time during which the voltage in question is maintained during the implementation of stage (1b).

In one preferred embodiment, the voltage applied in stage (1b) is applied over a duration in a range from at least 10 to 500 seconds or from at least 20 to 400 seconds or from at least 30 to 300 seconds or from at least 40 to 250 seconds or from at least 50 to 200 seconds, more preferably in a range from at least 60 to 150 seconds or from at least 70 to 140 seconds or from at least 80 to 130 seconds.

The voltage increase from stage (1a) to stage (1b) may take place “suddenly”, in other words, for example, by corresponding switching to a rectifier, this requiring a certain technically related minimum time to attain the target voltage. The voltage increase may alternatively take place in the form of a ramp, in other words at least approximately continuously over a selectable period, as for example of up to 10, 20, 30, 40, 50, 60, 120, or 300 seconds. A preferred ramp is of up to 120 seconds, more preferably of up to 60 seconds. Also possible is a voltage increase in steps, in which case a certain holding time at the voltage is preferably observed for each of these voltage steps, of 1, 5, 10, or 20 seconds, for example. Also possible is a combination of ramps and steps.

The indication of a period such as, for example, of a period in the range from 10 to 300 seconds for the application of the voltage in stage (1b) in a range from 50 to 400 V may mean that this voltage is held constant during the stated period. Alternatively, however, the voltage may also adopt different values during the deposition time within stage (1b), within the stated minimum and maximum values in the range from 50 to 400 V—for example, it may swing back and forth or increase in a ramp or in steps from the minimum to the maximum deposition voltage.

The voltage, i.e., deposition voltage, in stage (1b) may also be regulated in the form of pulses, with times without current and/or with a deposition voltage below the minimum level between two pulses. The pulse duration may be situated, for example, in the range from 0.1 to 10 seconds. The “period” for the deposition is then considered preferably to be the sum of the durations in which the deposition voltage lies within the stated maximum and minimum levels in the implementation of step (1b). Ramps and pulses may also be combined with one another.

Further Optional Method Steps

The method of the invention optionally further comprises a step (2), preferably following step (1), which as set out above entails two stages (1a) and (1b), as follows:

-   -   (2) contacting the substrate at least partly coated with the         coating composition (A) with an aqueous sol-gel composition         prior to curing of the deposited coating composition (A).

The skilled person knows the terms “sol-gel composition”, “sol-gel”, and the preparation of sol-gel compositions and sol-gels, from—for example—D. Wang et al., Progress in Organic Coatings 2009, 64, 327-338 or S. Zheng et al., J. Sol-Gel. Sci. Technol. 2010, 54, 174-187.

An aqueous “sol-gel composition” in the sense of the present invention is preferably an aqueous composition prepared by reacting at least one starting compound with water, with hydrolysis and condensation, this starting compound having at least one metal atom and/or semimetal atom such as M¹ and/or M², for example, and having at least two hydrolyzable groups such as, for example, two hydrolyzable groups X¹, and further, optionally, having at least one nonhydrolyzable organic radical such as R¹, for example. The at least two hydrolyzable groups here are preferably each bonded directly to the at least one metal atom and/or at least one semimetal atom present in the at least one starting compound, in each case by means of a single bond. Because of the presence of the nonhydrolyzable organic radical such as R¹, for example, a sol-gel composition of this kind used in accordance with the invention may also be termed a “sol-gel hybrid composition”.

The aqueous sol-gel composition used in accordance with the invention in the optional step (2) is preferably obtainable by reaction of

-   -   at least one compound Si(X¹)₃(R¹),         -   where R¹ therein is a nonhydrolyzable organic radical which             has at least one reactive functional group selected from the             group consisting of primary amino groups, secondary amino             groups, epoxide groups, and groups which have an             ethylenically unsaturated double bond,         -   more particularly at least one compound Si(X¹)₃(R¹) where R¹             therein is a nonhydrolyzable organic radical which has at             least one epoxide group as a reactive functional group, and             in which X¹ is a hydrolyzable group such as an O—C₁₋₆ alkyl             group, for example, and, moreover,         -   optionally at least one further compound Si(X¹)₃(R¹) where             R¹ therein is a nonhydrolyzable organic radical which has at             least one reactive functional group selected from the group             consisting of primary amino groups and secondary amino             groups, and in which X¹ is a hydrolyzable group such as an             O—C₁₋₆ alkyl group, for example,     -   and optionally at least one compound Si(X¹)₄ in which X¹ is a         hydrolyzable group such as an O—C₁₋₆ alkyl group, for example,     -   and optionally at least one compound Si(X¹)₃(R¹),         -   where R¹ therein is a nonhydrolyzable organic radical which             has no reactive functional group, such as a C₁₋₁₀ alkyl             radical for example, and in which X¹ is a hydrolyzable group             such as an O—C₁₋₆ alkyl group, for example,     -   and optionally at least one compound Zr(X¹)₄ in which X¹ is a         hydrolyzable group such as an O—C₁₋₆ alkyl group, for example,     -   with water.

The method of the invention preferably further comprises a step (3), which preferably follows step (1) or step (2), as follows:

-   -   (3) rinsing the substrate coated at least partly with the         aqueous coating composition (A), obtainable after step (1) or         step (2), with water and/or with ultrafiltrate.

The term “ultrafiltrate” or “ultrafiltration”, particularly in connection with electrodeposition coating, is familiar to the skilled person and is defined, for example, in Römpp Lexikon, Lacke und Druckfarben, Georg Thieme Verlag 1998.

The implementation of step (3) permits the recycling of excess constituents of the inventively employed aqueous coating composition (A), present after step (1) on the at least partly coated substrate, into the dip-coating bath.

The method of the invention may further comprise an optional step (4), which preferably follows step (1) or (2) or (3), namely a step (4) of

-   -   (4) contacting the substrate at least partly coated with the         aqueous coating composition (A), obtainable after step (1) or         step (2) or step (3), with water and/or ultrafiltrate,         preferably over a duration of 30 seconds up to one hour, more         preferably over a duration of 30 seconds up to 30 minutes.

The method of the invention may further comprise an optional step (4a), which preferably follows step (1), more particularly stage (1b), or (2) or (3) or (4), namely a step (4a) of

-   -   (4a) contacting the substrate at least partly coated with the         aqueous coating composition (A), obtainable after step (1) or         step (2) or step (3) or step (4), with an aqueous solution or         dispersion, preferably an aqueous solution, of at least one         crosslinking catalyst (V), preferably of at least one         crosslinking catalyst (V) which is suitable for crosslinking the         reactive functional groups of the binder (A1), more particularly         of an epoxide-based polymeric resin and/or acrylate-based         polymeric resin used as binder (A1).

The aqueous solution of the at least one crosslinking catalyst (V) is preferably an aqueous solution of a bismuth compound such as, for example, an aqueous solution comprising a compound containing trivalent bismuth. During the implementation of the optional step (4a), a cathodic voltage relative to an anode is preferably applied to the electrically conductive substrate used, more preferably in a range from 4 V to 100 V. Carrying out step (4a) permits efficient crosslinking in the case where too small an amount of component (A3) remains in the coating composition after implementation of stage (1a) of step (1) to be deposited in stage (1b).

In one preferred embodiment the method of the invention further comprises at least one step (5), which preferably follows step (1) and/or (2) and/or (3) and/or (4) and/or (4a), but is preferably carried out before an optional step (6), as follows:

-   -   (5) applying at least one further coating film to the substrate         coated at least partly with the inventively employed aqueous         coating composition (A) and obtainable after step (1) and/or (2)         and/or (3) and/or (4) and/or (4a).

By means of step (5) it is possible for one or more further coating films to be applied to the substrate at least partly coated with the coating composition (A) and obtainable after step (1) and/or (2) and/or (3) and/or (4) and/or (4a). If two or more coats have to be applied, step (5) may be repeated often accordingly. Examples of further coating films for application are, for example, basecoat films, surfacer films and/or single-coat or multi-coat topcoat films. The aqueous coating composition (A) applied by step (1), optionally after having been subjected to a subsequent rinse with an aqueous sol-gel composition as per step (2) and/or to an optional rinse with water and/or ultrafiltrate (as per step (3)), and/or after step (4) and/or (4a) has been carried out, can be cured, this curing taking place as described below as per step (6), before a further coat is applied such as a basecoat film, surfacer film and/or a single-coat or multicoat topcoat film. Alternatively, however, the aqueous coating composition (A) applied by step (1), optionally after having been subjected to a subsequent rinse with an aqueous sol-gel composition as per step (2) and/or to an optional rinse with water and/or ultrafiltrate (as per step (3)), and/or after step (4) and/or (4a) has been carried out, may not be cured, but instead firstly a further coat may be applied such as a basecoat film, surfacer film and/or a single-coat or multicoat topcoat film (“wet-on-wet method”). In this case, following application of this or these further coat(s), the overall system thus obtained is cured, it being possible for this curing to take place as described below, preferably in accordance with a step (6).

In one preferred embodiment the method of the invention further comprises at least one step (6), as follows:

-   -   (6) curing the aqueous coating composition (A) applied at least         partly to the substrate after step (1) and/or optionally (2)         and/or (3) and/or (4) and/or (4a), or the coating applied at         least partly to the substrate after step (1) and/or         optionally (2) and/or (3) and/or (4) and/or (4a) and/or (5).

Step (6) of the method of the invention is carried out preferably by means of baking after step (1) or optionally (2) or optionally only after at least one further step (5). Step (6) takes place preferably in an oven. The curing here takes place preferably at a substrate temperature in the range from 140° C. to 200° C., more preferably in a range from 150° C. to 190° C., very preferably in a range from 160° C. to 180° C. Step (6) takes place preferably over a duration of at least 2 minutes to 2 hours, more preferably over a duration of at least 5 minutes to 1 hour, very preferably over a duration of at least 10 minutes to 30 minutes.

At Least Partly Coated Substrate

A further subject of the present invention is an electrically conductive substrate coated at least partly with the aqueous coating composition (A) of the invention, or an at least partly coated electrically conductive substrate which is obtainble by means of the method of the invention for at least partly coating an electrically conductive substrate with an electrocoat material.

A further subject of the present invention is a preferably metallic component or preferably metallic article produced from at least one such substrate.

Such articles may be, for example, metal strips. Components of this kind may be, for example, bodies and body parts of vehicles such as automobiles, trucks, motorcycles, buses, and coaches, and components of electrical household products, or else components from the area of apparatus claddings, façade claddings, ceiling claddings, or window profiles.

Method for Adjusting and/or Maintaining the Concentrations of Components (A3) and/or Optionally Present (A4) in the Coating Composition (A)

A further subject of the present invention is a method for adjusting and/or maintaining the concentration of component (A3) and/or optionally present (A4) in the coating composition (A) of the invention during the implementation of the method of the invention for at least partly coating an electrically conductive substrate with an electrocoat material.

All preferred embodiments described hereinabove in connection with the aqueous coating composition (A) of the invention and the method of the invention for at least partly coating an electrically conductive substrate with an electrocoat material are also preferred embodiments of the aqueous coating composition (A) of the invention in the context of its use in the method of the invention for adjusting and/or maintaining the concentration of component (A3) and/or optionally present (A4) in the coating composition (A) of the invention during the implementation of the method of the invention for at least partly coating an electrically conductive substrate with an electrocoat material.

The method of the invention for adjusting and/or maintaining the concentration of component (A3) and/or optionally (A4) in the coating composition (A) of the invention envisages, during the implementation of the (coating) method of the invention, that

-   -   at preselected intervals of time, a determination is made of the         fraction of component (A3) and/or optionally (A4) in the coating         composition (A) in ppm, based on the total weight of the coating         composition (A),     -   and     -   the fraction of component (A5) in the coating composition (A) is         increased no later than when the fraction of component (A3) in         ppm is lower than a preselected setpoint value for this         component in the coating composition (A),     -   or     -   the fraction of component (A4) optionally present in the coating         composition (A) is increased no later than when the fraction of         component (A4) in ppm is lower than a preselected setpoint value         for this component in the coating composition (A).

The method of the invention allows independent metering of components (A5) and/or (A4), respectively, and hence allows flexibility in terms of the desired setting of these parameters which, moreover, is easy to implement.

The preselected setpoint value of component (A3) in the coating composition (A) may be the minimum amount of this component in ppm, based on the total weight of the coating composition (A). The minimum amount of component (A3) in the coating composition of the invention is at least 30 ppm of bismuth, based on the total weight of the coating composition (A). The minimum amount of (A3) in (A) encompasses, moreover, all minimum amounts of component (A3) stated above in preferred embodiments in connection with the coating composition (A).

The preselected setpoint value of component (A4) optionally present in the coating composition (A) may be the minimum amount of this component in ppm, based on the total weight of the coating composition (A). The minimum amount of component (A4) optionally present in the coating composition of the invention is at least 100 ppm of bismuth, based on the total weight of the coating composition (A). The minimum amount of (A4) encompasses, moreover, all minimum amounts of component (A4) stated above in preferred embodiments in connection with the coating composition (A).

The preselected setpoint values of components (A3) and optionally (A4) in the coating composition (A) in ppm may alternatively also in each case be greater than the minimum amounts of components (A3) and (A4) in (A). The setpoint value of component (A3) in (A) is preferably 40 ppm or 100 ppm or 200 ppm or 300 ppm or 500 ppm or 1000 ppm, based in each case on the total weight of the coating composition (A). The setpoint value of component (A4) optionally present in (A) is preferably 500 ppm or 1000 ppm or 1600 ppm or 2600 ppm, based in each case on the total weight of the coating composition (A).

The method of the invention makes it possible in particular to be able to avoid accumulation of the complexing agent (A5) in the coating composition (A). The complexing agent (A5), after deposition (and, resulting therefrom, after “consumption”) of the component (A3) present in the coating composition, during the implementation of stage (1a) of the method of the invention for at least partly coating an electrically conductive substrate with an electrocoat material, is preferably released again in the dip-coating bath or in the coating composition (A). A resultant accumulation of the complexing agent (A5) in the coating composition (A) can lead to problems with the stability of the dip-coating bath. This problem can be countered by raising the fraction of component (A4) optionally present in the coating composition (A). Should, in contrast, the fraction of (A5) and hence also the fraction of (A3) in the coating composition (A) become too low (as a result, for example, of entrainment loss via the anolyte circuit or of losses in the ultrafiltration), this can be counteracted by raising the fraction of component (A5) in the coating composition (A).

The expression “at preselected intervals of time” refers in the sense of the present invention preferably to any interval of time that is suitable and known to the skilled person, and which may lie in the range of hours, days, or weeks. With particular preference the fraction of component (A3) and/or optionally (A4) in the coating composition (A) in ppm, based on the total weight of the coating composition (A), is determined daily or weekly, more particularly weekly.

Methods of Determination

1. Salt Spray Mist Testing to DIN EN ISO 9227 NSS

The salt spray mist test is used for determining the corrosion resistance of a coating on a substrate. In accordance with DIN EN ISO 9227 NSS (date: Sep. 1, 2012), the salt spray mist test is carried out for the electrically conductive substrate cold-rolled steel (CRS), coated with an inventive coating composition or with a comparative coating composition. In this test, the samples under analysis are in a chamber in which there is continuous misting with a 5% strength common salt solution at a temperature of 35° C. over a duration of 504 or 1008 hours at a controlled pH in the range from 6.5 to 7.2. The mist deposits on the samples under analysis, covering them with a corrosive film of salt water.

If, still prior to the salt spray mist test to DIN EN ISO 9227 NSS, the coating on the samples under analysis is scored down to the substrate with a blade incision, the samples can be investigated for their level of under-film corrosion (undermining) to DIN EN ISO 4628-8 (date: Mar. 1, 2013), since the substrate corrodes along the score line during the DIN EN ISO 9227 NSS salt spray mist test. This investigation takes place after the salt spray mist test has been carried out for a duration of 504 hours or for a duration of 1008 hours. As a result of the progressive process of corrosion, the coating is undermined to a greater or lesser extent during the test. The extent of undermining in [mm] is a measure of the resistance of the coating to corrosion.

2. Filiform Corrosion to DIN EN 3665

Determining the filiform corrosion is used to ascertain the corrosion resistance of a coating on a substrate. This determination is carried out to DIN EN 3665 (Aug. 1, 1997) for the electrically conductive substrate aluminum (ALU), coated with an inventive coating composition or with a comparative coating composition, over a duration of 1008 hours. In the course of this time, the coating in question, starting from a line of induced damage to the coating, is undermined by corrosion that takes the form of a line or thread. The maximum thread length in [mm] is measured according to DIN EN 3665 (method 3). The average thread length in [mm] is determined according to PAPP WT 3102 (Daimler) (date: Dec. 21, 2006). The maximum and average thread lengths are a measure of the resistance of the coating to corrosion.

3. VDA Alternating Climate Test to VDA 621-415 [German Automakers Association]

This alternating climate test is used for examining the corrosion resistance of a coating on a substrate. The alternating climate test is carried out for the correspondingly coated cold-rolled steel (CRS) substrate. The alternating climate test is carried out in 10 cycles. One cycle here consists of a total of 168 hours (1 week) and encompasses

-   -   a) 24 hours of salt spray mist testing as per DIN EN ISO 9227         NSS (date: Sep. 1, 2012),     -   b) followed by 8 hours of storage, including heating, as per DIN         EN ISO 6270-2 of September 2005, AHT method,     -   c) followed by 16 hours of storage, including cooling, as per         DIN EN ISO 6270-2 of September 2005, AHT method,     -   d) 3-fold repetition of b) and c) (hence in total 72 hours), and     -   e) 48 hours of storage, including cooling, with an aerated         climate chamber as per DIN EN ISO 6270-2 of September 2005, AHT         method.

If, still prior to the alternating climate test being carried out, the respective baked coating on the samples under analysis is scored down to the substrate with a blade incision, the samples can be investigated for their level of under-film corrosion to DIN EN ISO 4628-8 (date: Mar. 1, 2013), since the substrate corrodes along the score line during the performance of the alternating climate test. As a result of the progressive process of corrosion, the coating is undermined to a greater or lesser extent during the test. The extent of undermining in [mm] is a measure of the resistance of the coating.

4. X-Ray Fluorescence Analysis (XFA) for Film Weight Determination

The film weight (in mg per m² surface area) of the coating under investigation is determined by means of wavelength-dispersive X-ray fluorescence analysis (XFA) according to DIN 51001 (date: August 2003). In this way, for example, the bismuth content or bismuth layer add-on of a coating can be determined, such as, for example, that of the coating obtained after stage (1a) of step (1) of the method of the invention. By analogy it is also possible to determine the respective amount of other elements such as zirconium, for example. The signals obtained when carrying out the X-ray fluorescence analysis are corrected to account for a separately measured substrate of an uncoated reference sample. Gross count rates (in kilocounts per second) are determined for each of the elements under analysis, such as bismuth. The gross count rates of the respective elements of a reference sample (uncoated substrate) are subtracted from the respective gross count rates determined in this way for the sample in question, to give the net count rates for the elements under analysis. These are converted, using an element-specific transfer function (obtained from a calibration measurement), into film weights (mg/cm²). Where a number of coats are applied, the respective film weight is determined after each application. Then, for a subsequent coat, the gross count rate of the preceding film in each case counts as a reference. This method of determination is used to determine the bismuth content of the coating obtained after stage (1a) of step (1) of the method of the invention.

5. Atomic Emission Spectrometry (ICP-OES) for Determining the Amounts of (A3) and Optionally (A4) in (A) and Also the Total Amount of Bismuth Present in the Coating Composition (A)

The amount of certain elements in a sample under analysis, such as the bismuth content, for example, is determined using inductively coupled plasma atomic emission spectrometry (ICP-OES) according to DIN EN ISO 11885 (date: Sep. 1, 2009). The sample used is a solution of the respective sample, such as a sample of the ultrafiltrate, for example. The ultrafiltration in this case is carried out for the duration of one hour (ultrafiltration in a circuit; ultrafiltration membrane: Nadir, PVDF, RM-UV 150T). A sample is taken from the permeate or ultrafiltrate. This sample is subjected to thermal excitation in an argon plasma generated by a high-frequency field, and the light emitted due to electron transitions becomes visible as a spectral line of the corresponding wavelength, and is analyzed using an optical system. There is a linear relation between the intensity of the light emitted and the concentration of the element in question, such as bismuth. Prior to implementation, using known element standards (reference standards), the calibration measurements are carried out as a function of the particular sample under analysis. These calibrations can be used to determine concentrations of unknown solutions such as the concentration of the amount of (A3) in the ultrafiltrate. It is assumed here that component (A3), present in dissolved form in (A), is transferred completely into the ultrafiltrate.

This method of determination is used, however, to determine not only the amounts of component (A3) in the coating composition (A), but also the total amount of bismuth in the coating composition (A), insofar as the coating composition (A), besides (A3), also comprises component (A4). For this purpose, a sample of coating composition (A) is taken and this sample is digested by microwave to give a sample solution amenable to ICP-OES analysis: here, a sample of the coating composition (A) or of a comparative composition is weighed out, and the volatile constituents of this sample are removed by heating with a linear temperature increase from 18° C. to 130° C. over the course of an hour. An amount of up to 0.5 g of this resulting sample is admixed with a 1:1 mixture of nitric acid (65% strength) and sulfuric acid (96% strength) (5 ml of each of said acids) and then microwave digestion is carried out using an instrument from Berghof (Speedwave IV instrument). During the digestion, the sample mixture is heated to a temperature of 250° C. over 20 to 30 minutes, and this temperature is held for 10 minutes. Following the digestion, the remaining sample mixture should be a clear solution without a solids fraction. Using ICP-OES according to DIN EN ISO 11885, the total amount of bismuth in the sample in then ascertained. When the fraction of (A3) is subtracted from this amount, said fraction of (A3) being determined as elucidated above, the result is the fraction of component (A4) optionally present in the sample under analysis.

The examples which follow serve to elucidate the invention, but should not be interpreted as imposing any restriction.

Unless otherwise noted, the figures in percent hereinafter are in each case percentages by weight.

INVENTIVE AND COMPARATIVE EXAMPLES

1. Production of Inventive Aqueous Coating Compositions and of a Comparative Coating Composition V1

The CathoGuard® 520 and CathoGuard® 800 pigment pastes from BASF that are used for producing the exemplary inventive coating compositions below contain bismuth subnitrate. The skilled person knows of the production of such pigment pastes from, for example, DE 10 2008 016 220 A1 (page 7, table 1, variant B).

Coating Composition Z1

9 g of the commercially available product Quadrol (N,N,N′,N′-tetrakis-2-hydroxypropylethylenediamine) are introduced into 2402.5 g of deionized water to produce a mixture M1. The mixture M1 is subsequently admixed, furthermore, with 295 g of a pigment paste (commercially available product CathoGuard® 520 from BASF with a solids content of 65.0 wt %) with stirring at room temperature (18-23° C.), to give the mixture M2. The mixture M2 is stirred over a time of 26 hours at room temperature (18-23° C.). This resulting mixture is subsequently admixed with 2215 g of an aqueous dispersion of a binder and of a crosslinking agent (commercially available product CathoGuard® 520 from BASF with a solids content of 37.5 wt %). Following this addition, the resulting mixture is admixed with an amount of acetic acid so as to bring about a pH of 5.7. The molar ratio of bismuth (calculated as metal) to Quadrol® in the coating composition is 1:0.5.

Coating Composition Z2

Coating composition Z2 is produced in analogy to the method described in connection with coating composition Z1, with the difference that instead of Quadrol (N,N,N′,N′-tetrakis-2-hydroxypropylethylenediamine, 5.02 g of the commercially available product bicine (N,N′-bis(2-hydroxyethyl)glycine) are used. The molar ratio of bismuth (calculated as metal) to bicine in the coating composition is 1:0.5.

Coating Composition Z3

Coating composition Z3 is produced in analogy to the method described in connection with coating composition Z1, with the difference that instead of Quadrol (N,N,N′,N′-tetrakis-2-hydroxypropylethylenediamine), 7.27 g of THEED (N,N,N′,N′-tetrakis-2-hydroxyethylethylenediamine) are used. Furthermore, before addition of the aqueous dispersion of the binder and crosslinking agent, the mixture M2 is stirred for a time of 23 hours at room temperature (18-23° C.). The molar ratio of bismuth (calculated as metal) to THEED in the coating composition is 1:0.5.

Coating Composition Z4

Coating composition Z4 is produced by adding a further 15.06 g of bicine (N,N′-bis((2-hydroxyethyl)glycine) to coating composition Z2. Moreover, thereafter, a pH of 5.55 is set by addition of acetic acid. The molar ratio of bismuth (calculated as metal) to bicine in the coating composition is 1:2.

Table 1a provides an overview of the resulting inventive coating compositions Z1 to Z4.

TABLE 1a Inventive examples Z1-Z4 Z1 Z2 Z3 Z4 CathoGuard ® 520/wt % 48.82  48.86  48.83  48.71  THEED/wt % — — 0.15 — Quadrol/wt % 0.18 — — — Bicine/wt % — 0.10 — 0.41 Deionized water/wt % 45.01  45.04  45.02  44.91  Pigment paste CathoGuard ® 5.99 6.00 6.00 5.98 520 containing bismuth subnitrate/wt % pH 5.70 5.70 5.70 5.55 Conductivity/μS/cm — — — —

The respective pH values in table 1a are determined in each case at a temperature in the range from 18 to 23° C., where ascertained. Where the pH of the respective coating composition is adjusted subsequently by addition of an acid, the amounts of acid used are not given in the table above.

Coating Composition Z5

60.24 g of bicine (N,N′-bis(2-hydroxyethyl)glycine) are introduced into 2564 g of deionized water to produce a mixture M1. The mixture M1 is subsequently admixed, furthermore, with 306 g of a pigment paste (commercially available product CathoGuard® 800 from BASF with a solids content of 65 wt %) with stirring at room temperature (18-23° C.), to give the mixture M2. The mixture M2 is then stirred over a time of 22 hours at room temperature (18-23° C.). This resulting mixture is subsequently admixed with 2130 g of an aqueous dispersion of a binder and of a crosslinking agent (commercially available product CathoGuard® 800 from BASF with a solids content of 37.5 wt %). The molar ratio of bismuth (calculated as metal) to Bicine® in the coating composition is 1:6.

Coating Composition Z6

87.26 g of THEED are introduced into 2564 g of deionized water to prepare a mixture M1, and the pH of the mixture M1 is adjusted to 5.7 by addition of acetic acid. Added subsequently to the mixture M1, moreover, are 306 g of a pigment paste (commercially available product CathoGuard® 520 from BASF with a solids content of 65 wt %) with stirring at room temperature (18-23° C.), to give the mixture M2. The mixture M2 is stirred over a time of 22 hours at room temperature (18-23° C.). This resulting mixture is thereafter admixed with 2130 g of an aqueous dispersion of a binder and of a crosslinking agent (commercially available product CathoGuard® 520 from BASF with a solids content of 37.5 wt %). The molar ratio of bismuth (calculated as metal) to THEED in the coating composition is 1:6.

Coating Composition Z7

Coating composition Z7 is produced in analogy to the method described in connection with coating composition Z5, with the difference that instead of bicine, 53.99 g of Quadrol are used and, following addition of the pigment paste, the pH of the mixture M2 is adjusted to 5.68 by addition of lactic acid. Moreover, following addition of the aqueous dispersion of the binder and of the crosslinking agent, the pH is again adjusted using lactic acid to 5.7. The molar ratio of bismuth (calculated as metal) to Quadrol® in the coating composition is 1:3.

Table 1b provides an overview of the resulting inventive coating compositions Z5 to Z7.

TABLE 1b Inventive examples Z5-7 Z5 Z6 Z7 CathoGuard ® 800/wt % 42.09 — 42.14 CathoGuard ® 520/wt % — 41.87 — Bicine/wt % 1.19 — — THEED/wt % — 1.72 — Quadrol/wt % — — 1.07 Deionized water/wt. % 50.67 50.40 50.73 Pigment paste CathoGuard ® 6.05 — 6.05 800 containing bismuth subnitrate/wt % Pigment paste CathoGuard ® — 6.02 — 520 containing bismuth subnitrate/wt % pH 5.61 5.77 5.70 Conductivity/μS/cm 2070 5210 3340

The respective pH values and conductivities in table 1b are determined in each case at a temperature in the range from 18 to 23° C. Where the pH of the respective coating composition is adjusted subsequently by addition of an acid, the amounts of acid used are not given in the table above.

Coating Composition Z8

A mixture of bicine (N,N′-bis((2-hydroxyethyl)glycine) (32.6 g) and deionized water (910 g) and bismuth subnitrate (57.4 g) is prepared and is stirred for a time of 24 hours at a temperature in a range from 18 to 23° C. The undissolved fraction is then separated off using a fluted filter. The filtrate is made up to 1000 g with deionized water and the bismuth content is determined by X-ray fluorescence analysis. It amounts to 5 g/kg. The filtrate thus admixed with deionized water is used as Bi1.

An aqueous dispersion of a binder and crosslinking agent (commercially available product CathoGuard® 520 from BASF, with a solids content of 37.5 wt %), a pigment paste P1, and fractions of deionized water are combined and mixed with stirring at room temperature (18-23° C.). A total of 2130 g of CathoGuard® 520, 306 g of pigment paste P1, and 1564 g of deionized water are used here. Subsequently Bi1 (1000 g) is added to prepare the coating composition Z8, and the resulting mixture is stirred for a time of 24 hours.

The pigment paste P1 which is used is prepared in accordance with the method described in DE 10 2008 016 220 A1, page 7, table 1, variant B, but in the present case no bismuth subnitrate is used for preparing the pigment paste P1. The pigment paste P1 therefore contains no bismuth subnitrate.

Coating Composition Z9

A mixture of bicine (N,N′-bis((2-hydroxyethyl)glycine) (40.32 g) and deionized water (508.2 g) and bismuth subnitrate (9.0 g) is prepared and is stirred for a time of 24 hours at a temperature in a range from 18 to 23° C. The undissolved fraction is then separated off using a fluted filter. The filtrate is made up to 1000 g with deionized water and the bismuth content is determined by X-ray fluorescence analysis. It amounts to 5.82 g/kg. The filtrate thus admixed with deionized water is used as Bi2.

An aqueous dispersion of a binder and crosslinking agent (commercially available product CathoGuard® 800 from BASF, with a solids content of 37.5 wt %), a pigment paste P1, and fractions of deionized water are combined and mixed with stirring at room temperature (18-23° C.). Pigment paste P1 corresponds to the pigment paste used in preparing Z8. A total of 1830 g of CathoGuard® 800, 223 g of pigment paste P1, and 1079 g of deionized water are used here. Subsequently Bi2 (998 g) is added to prepare the coating composition Z9, and the resulting mixture is stirred for a time of 24 hours.

Coating Composition Z10

A mixture of Bicin® (N,N′-bis((2-hydroxyethyl)glycine) (96.60 g) and deionized water (846.0 g) and bismuth subnitrate (57.4 g) is prepared and is stirred for a time of 24 hours at a temperature in a range from 18 to 23° C. The undissolved fraction is then separated off using a fluted filter. The filtrate is made up to 1000 g with deionized water and the bismuth content is determined by X-ray fluorescence analysis. It amounts to 13.50 g/L. The filtrate thus admixed with deionized water is used as Bi3.

An aqueous dispersion of a binder and crosslinking agent (commercially available product CathoGuard® 800 from BASF, with a solids content of 37.5 wt %), a pigment paste P1, and fractions of deionized water are combined and mixed with stirring at room temperature (18-23° C.). Pigment paste P1 corresponds to the pigment paste used in preparing Z8 and Z9. A total of 2215 g of CathoGuard® 800, 270 g of pigment paste P1, and 2330 g of deionized water are used here. Subsequently Bi3 (185 g) is added to prepare the coating composition Z10, and the resulting mixture is stirred for a time of 24 hours.

Comparative Coating Composition V1

An aqueous dispersion of a binder and of a crosslinking agent (commercially available product CathoGuard® 520 from BASF with a solids content of 37.5 wt %), a pigment paste (commercially available product CathoGuard® 520 from BASF with a solids content of 65.0 wt %), and fractions of deionized water are combined to form a comparative coating composition (V1) and mixed with stirring at room temperature (18-23° C.). A total of 2275 g of CathoGuard® 520, 295 g of CathoGuard® 520 pigment paste, and 2430 g of deionized water are used. The pigment paste used to prepare V1, CathoGuard® 520 from BASF, contains bismuth subnitrate.

Comparative Coating Composition V2

Coating composition V2 is prepared in analogy to the method described in connection with coating composition Z1, with the difference that instead of Quadrol 23.11 g of taurine are used and, following addition of the pigment paste, the pH of the mixture M2 is adjusted to 5.70 by addition of acetic acid. The molar ratio of bismuth (calculated as metal) to taurine in the coating composition is 1:3.

Comparative Coating Composition V3

Coating composition V3 is prepared in analogy to the method described in connection with coating composition Z1, with the difference that instead of Quadrol 13.86 g of L-asparagine are used and, following addition of the pigment paste, the pH of the mixture M2 is adjusted to 5.70 by addition of acetic acid. The molar ratio of bismuth (calculated as metal) to L-asparagine in the coating composition is 1:1.5.

Table 1c provides an overview of the resulting inventive coating compositions Z8 to Z10 and also of V1 to V3.

TABLE 1c Examples Z8-Z10 Z8 Z9 Z10 V1 V2 V3 CathoGuard ® 44.59 — — 45.50 48.68  48.77  520/wt % CathoGuard ® — 44.31 44.30 — — — 800/wt % Bi1/wt % 19.31 — — — — — Bi2/wt % — 24.16 — — — — Bi3/wt % — — 3.70 — — — Taurine/wt % — — — — 0.47 — L-Asparagine/ — — — — — 0.28 wt % Deionized 30.19 26.13 46.60 48.60 44.87  44.97  water/wt % Pigment paste 5.91 5.40 5.40 — — — P1/wt % Pigment paste — — — 5.90 5.98 5.98 CathoGuard ® 520/wt % pH 6.0 5.70 5.70 5.30 5.70 5.70 Conductivity/ 2500 2000 2300 2190 — — μS/cm

The respective pH values and conductivities (where determined) in table 1c are ascertained in each case at a temperature in the range from 18 to 23° C. If the pH of the coating composition in question is adjusted subsequently by addition of an acid, the amounts of acid used are not given in the table above.

After they been produced, each of the coating compositions Z1-Z10 and V1-V3 thus produced is introduced into a dip-coating bath. The coating compositions Z1 to Z5 and also Z8 to Z10 are ultrafiltered at a temperature in the range from 18-23° C. over a time of 60 minutes, and then a determination of the bismuth content, calculated as metal, in mg/L in the ultrafiltrate is made by means of atomic emission spectroscopy (ICP-OES) in accordance with the method described above. The corresponding values are reproduced in table id.

TABLE 1d Coating Bismuth content of composition ultrafiltrate/mg/L V1 6.4 Z1 310 Z2 44 Z3 100 Z4 190 Z5 1100 Z8 300 Z9 790 Z10 140 2. Production of Coated Electrically Conductive Substrates by Means of One of the Inventive Aqueous Coating Compositions 21-210 or of the Comparative Coating Compositions V1-V3

The aqueous coating compositions Z1-Z10 and V1-V3 are each applied as dip coatings to different substrates. Each of the compositions Z1-Z10 and V1-V3, is applied to the various substrates immediately after its production as described above.

Three kinds of metal test panels are used, these being T1 (hot dip galvanized steel (HDG)) and T2 (aluminum (ALU)) and also T3 (cold-rolled steel (CRS)) as examples of electrically conductive substrates. Each of the two sides of the respective panels used has an area of 10.5 cm·19 cm, giving an overall area of around 400 cm².

They are first of all cleaned in each case by immersion of the panels into a bath containing an aqueous solution comprising the commercially available products Ridoline 1565-1 (3.0 wt %) and Ridosol 1400-1 (0.3 wt %) from Henkel, and also water (96.7 wt %), for a time of 1.5 to 3 minutes at a temperature of 62° C. This is followed by mechanical cleaning (using fine brushes), after which the panels are again immersed into the bath for a time of 1.5 minutes.

The substrates cleaned in this way are subsequently rinsed with water (for a time of 1 minute) and with deionized water (for a time of 1 minute).

Immediately thereafter, one of the inventively employed aqueous coating compositions Z1 to Z10 is applied to each panel T1, T2, and T3, respectively, with the respective panel being immersed in each case into a corresponding dip-coating bath comprising one of the compositions Z1 to Z10. The dip-coating bath here has a respective temperature of 32° C.

Coating in the dip-coating bath is carried out by means of a two-stage deposition step and coating step, which provides two stages (1a) and (1b), where first of all, galvanostatically, current strengths in the range from 0.02 to 0.32 A are applied for a time of 120 seconds (corresponding to stage (1a)), to give a preliminary deposition of bismuth. In certain cases, moreover, the deposition time at a defined current strength is varied. The results of this preliminary bismuth deposition as per stage (1a) of the step are shown below in tables 2a to 2g. The bismuth content here in each case is determined according to the above-described X-ray fluorescence analysis (XFA).

Tables 2a to 2m:

TABLE 2a bismuth layer add-on (in mg of bismuth per m² of surface area) of the coating applied to the substrates T1, T2, and T3 after implementation of stage (1a), starting from the coating composition Z1, at different current strengths, in each case over a time of 120 seconds Current T1, bismuth T2, bismuth T3, bismuth strength content in content in content in in [A] [mg/m²] [mg/m²] [mg/m²] 0.16 23 11 17 0.18 25 16 16 0.20 26 17 15 0.22 29 15 13 0.24 22 25 22

TABLE 2b bismuth layer add-on (in mg of bismuth per m² of surface area) of the coating applied to the substrates T1, T2, and T3 after implementation of stage (1a), starting from the coating composition Z2, at different current strengths, in each case over a time of 120 seconds Current T1, bismuth T2, bismuth T3, bismuth strength content in content in content in in [A] [mg/m²] [mg/m²] [mg/m²] 0.16 50 36 48 0.18 50 36 46 0.20 47 32 48 0.22 44 39 42 0.24 55 —* 56 *not determined

TABLE 2c bismuth layer add-on (in mg of bismuth per m² of surface area) of the coating applied to the substrates T1, T2, and T3 after implementation of stage (1a), starting from the coating composition Z3, at different current strengths, in each case over a time of 120 seconds Current T1, bismuth T2, bismuth T3, bismuth strength content in content in content in in [A] [mg/m²] [mg/m²] [mg/m²] 0.16 43 27 25 0.18 49 28 27 0.20 48 30 25 0.22 38 25 24 0.24 39 37 36

TABLE 2d bismuth layer add-on (in mg of bismuth per m² of surface area) of the coating applied to the substrates T1, T2, and T3 after implementation of stage (1a), starting from the coating composition Z4, at different current strengths, in each case over a time of 120 seconds Current T1, bismuth T2, bismuth T3, bismuth strength content in content in content in in [A] [mg/m²] [mg/m²] [mg/m²] 0.16 132 84 99 0.18 —* —* 116 0.20 135 93 104 0.22 —* —* 103 0.24 122 —* 98 0.26 121 82 96 0.28  97 80 84 0.30  99 78 81 0.32 —* —* 86 *not determined

TABLE 2e bismuth layer add-on (in mg of bismuth per m² of surface area) of the coating applied to the substrates T1, T2, and T3 after implementation of stage (1a), starting from the coating composition Z5, at different current strengths, in each case over a time of 120 seconds Current T1, bismuth T2, bismuth T3, bismuth strength content in content in content in in [A] [mg/m²] [mg/m²] [mg/m²] 0.05 491 60 47 0.08 482 138 122 0.11 473 216 203 0.14 478 299 303 0.17 480 344 343 0.20 531 376 336 0.23 443 368 330 0.26 412 409 325 0.29 352 347 293

TABLE 2f bismuth layer add-on (in mg of bismuth per m² of surface area) of the coating applied to the substrates T1 and T3 after implementation of stage (1a), starting from the coating composition Z6, at different current strengths, in each case over a time of 120 seconds Current T1, bismuth T3, bismuth strength content in content in in [A] [mg/m²] [mg/m²] 0.05 101 39 0.08 152 72 0.11 214 100 0.14 238 128 0.17 272 150 0.20 281 181 0.23 —* 157 0.26 —* 185 0.29 —* 177 *not determined

TABLE 2g bismuth layer add-on (in mg of bismuth per m² of surface area) of the coating applied to the substrates T1, T2, and T3 after implementation of stage (1a), starting from the coating composition Z7, at different current strengths, in each case over a time of 120 seconds Current T1, bismuth T2, bismuth T3, bismuth strength content in content in content in in [A] [mg/m²] [mg/m²] [mg/m²] 0.05 228 32 34 0.08 207 72 80 0.11 193 106 104 0.14 246 134 120 0.17 239 160 124 0.20 248 156 121 0.23 216 147 101 0.26 203 138 85 0.29 —* —* 73 *not determined

TABLE 2h bismuth layer add-on (in mg of bismuth per m² of surface area) of the coating applied to the substrates T1, T2, and T3 after implementation of stage (1a), starting from the coating composition Z8, at a current strength of 0.13 A, over a time of 120 seconds Current T1, bismuth T2, bismuth T3, bismuth strength content in content in content in in [A] [mg/m²] [mg/m²] [mg/m²] 0.13 267 159 148

TABLE 2i bismuth layer add-on (in mg of bismuth per m²of surface area) of the coating applied to the substrates T1, T2, and T3 after implementation of stage (1a), starting from the coating composition Z9, at a current strength of 0.15 A/s, over different times Time T1, bismuth T2, bismuth T3, bismuth period content in content in content in [s] [mg/m²] [mg/m²] [mg/m²] 30 147.9 —* 64.9 60 209.3 —* 149.8 90 252.5 —* 222.4 120 334.2 290.6 301.3 *not determined

TABLE 2j-1 bismuth layer add-on (in mg of bismuth per m² of surface area) of the coating applied to the substrates T1, T2, and T3 after implementation of stage (1a), starting from the coating composition Z10, at different current strengths, over a time of 120 seconds Current T1, bismuth T2, bismuth T3, bismuth strength content in content in content in in [A] [mg/m²] [mg/m²] [mg/m²] 0 27.6 —* —* 0.05 63.8 38.7 31.2 0.08 —* —* 58.6 0.11 —* —* 61.5 0.14 60.9 53.7 62.8 0.17 —* —* 69.6 0.20 —* —* 62.7 0.23 62.6 59.3 60.0 *not determined

TABLE 2j-2 bismuth layer add-on (in mg of bismuth per m² of surface area) of the coating applied to the substrates T1, T2, and T3 after implementation of stage (1a), starting from the coating composition Z10, at a current strength of 0.15 A/s, over different times Time T3, bismuth period content in [s] [mg/m²] 90 54.1 120 61.7 150 72.2

TABLE 2k bismuth layer add-on (in mg of bismuth per m² of surface area) of the coating applied to the substrates T1, T2, and T3 after implementation of stage (1a), starting from the comparative coating composition V1, at a voltage of 4 V, over a time of 120 seconds T1, bismuth T2, bismuth T3, bismuth Voltage content in content in content in [V] [mg/m²] [mg/m²] [mg/m²] 4 0 0 5

TABLE 2l bismuth layer add-on (in mg of bismuth per m² of surface area) of the coating applied to the substrates T1, T2, and T3 after implementation of stage (1a), starting from the coating composition V2, at different current strengths, over a time of 120 seconds Current T1, bismuth T2, bismuth T3, bismuth strength content in content in content in in [A] [mg/m²] [mg/m²] [mg/m²] 0.10 16 6 12 0.12 16 6 11 0.14 16 7 11 0.16 15 9 11 0.18 15 9 11 0.20 14 8 11 0.22 13 8 10 0.24 12 8 10 *not determined

TABLE 2m bismuth layer add-on (in mg of bismuth per m² of surface area) of the coating applied to the substrates T1, T2, and T3 after implementation of stage (1a), starting from the coating composition V3, at different current strengths, over a time of 120 seconds Current T1, bismuth T2, bismuth T3, bismuth strength content in content in content in in [A] [mg/m²] [mg/m²] [mg/m²] 0.10 16 6 12 0.12 17 8 12 0.14 17 9 12 0.16 15 9 12 0.18 14 10 11 0.20 14 8 10 0.22 18 9 10 0.24 —* 18 19 *not determined

Subsequently, for some of the substrates obtained after stage (1a), stage (1b) of step (1) of the method of the invention is carried out, with application either of a voltage of 4 V, potentiostatically, or of current strengths in the range from 0.12 to 0.22 A, galvanostatically, each being raised over the course of stage (1b) continuously and linearly to a voltage in the region of 220-260 V, in each case over a time of 10 seconds, by means of a voltage ramp. This respectively voltage is then held for a time in the range from 60 to 120 seconds (hold time), to coat the respective substrate in a dry film thickness of 20 μm with the respective coating composition.

In detail, for coating of the substrates T2 or T3 with one of the compositions V1, Z3, Z6, Z1, Z12, or Z13, the following parameters are selected:

V1:

Stage (1a): 4 V over 120 seconds (potentiostatically)

Stage (1b): voltage ramp: linear increase in voltage to 260 V over a time of 10 seconds and hold time of 60 seconds at this voltage

Z2:

Stage (1a): 0.22 A over 120 seconds (galvanostatically)

Stage (1b): voltage ramp: linear increase in voltage to 240 V over a time of 10 seconds and hold time of 120 seconds at this voltage

Z4:

Stage (1a): 0.12 A over 120 seconds (galvanostatically)

Stage (1b): voltage ramp: linear increase in voltage to 240 V over a time of 10 seconds and hold time of 90 seconds at this voltage

Z5:

Stage (1a): 0.15 A over 120 seconds (galvanostatically)

Stage (1b): voltage ramp: linear increase in voltage to 250 V over a time of 10 seconds and hold time of 120 seconds at this voltage

Moreover, step (1) here is carried out with a dip-coating bath temperature of 34° C.

Z8:

Stage (1a): 0.13 A over 120 seconds (galvanostatically)

Stage (1b): voltage ramp: linear increase in voltage to 220 V over a time of 10 seconds and hold time of 90 seconds at this voltage

The baking step that follows is accomplished by baking the resulting coatings in each case at 175° C. (oven temperature) for a time of 25 minutes. The dry film thicknesses of the aqueous coating compositions of the invention baked onto the respective substrates are in each case 20 m.

3. Investigation of the Anticorrosion Effect of the Coated Substrates

The substrates T2 or T3 (T228 and T328), coated with the coating composition 28, and the substrates T2 or T3 (T2V1 and T3V1), coated with the comparative composition V1, are investigated.

All of the tests below were carried out in accordance with the aforementioned methods of determination and/or with the corresponding standard. Each value in table 3a or 3b is the average value (with standard deviation) from a double or triple determination.

TABLE 3a Inv. Inv. Inv. Inv. Comp. Ex. Ex. Ex. Ex. ex. Substrate T3 T3 T3 T3 T3 (CRS) (CRS) (CRS) (CRS) (CRS) Coating composition Z2 Z4 Z5 Z8 V1 Undermining [mm]  2.9 1.2 0.5 0.7  4.1 according to DIN EN ISO 4628-8 after 504 h of salt spray mist testing to DIN EN ISO 9227 NSS Undermining [mm] to 10.6 7.1 1.9 3.8 12.8 DIN EN ISO 4628-8 after 10 cycles of the VDA alternating climate test to VDA 621-415

TABLE 3b Inv. Inv. Inv. Inv. Comp. Ex. Ex. Ex. Ex. ex. Substrate T2 T2 T2 T2 T2 (ALU) (ALU) (ALU) (ALU) (ALU) Coating composition Z2 Z4 Z5 Z8 V1 Maximum thread length 9.6 7.4 8.9 8.9 12.4 [mm] as per DIN EN 3365 after 1008 h Average thread length 4.5 2.7 4.1 2.8  7.5 [mm] as per PAPP WT 3102 (Daimler) after filiform corrosion as per DIN EN 3365 after 1008 h

As can be seen from tables 3a and 3b, the substrates coated by the method of the invention with an aqueous coating composition of the invention consistently exhibit an improved anticorrosion effect in comparison to the substrate coated with the comparative coating composition. 

What is claimed is:
 1. An aqueous coating composition (A) for at least partly coating an electrically conductive substrate with an electrocoat material, comprising: (A1) at least one cathodically depositable binder; (A2) optionally at least one crosslinking agent; bismuth; and (A5) at least one at least bidentate complexing agent of formula (1) or an anion of said compound which is suitable for complexing bismuth; the coating composition (A) having a pH in a range from 4.0 to 6.5, wherein the coating composition (A) comprises a total amount of at least 130 ppm of bismuth, based on the total weight of the coating composition (A), including: (A3) at least 30 ppm of bismuth, based on the total weight of the coating composition (A), in a form in which it is in solution in the coating composition (A), and (A4) optionally at least 100 ppm of bismuth, based on the total weight of the coating composition (A), in a form in which it is not in solution in the coating composition (A),

wherein R¹ is a C₁₋₆ aliphatic radical substituted by at least one OH group, m is 0 or 1, R^(a) and R^(b) in each case independently of one another are selected from the group consisting of H and C₁₋₆ aliphatic radicals, optionally substituted by at least one OH group, and mixtures thereof, R², R³, R⁴, and R⁵ in each case independently of one another are H or are a C₁₋₆ aliphatic radical optionally substituted by at least one OH group, n is 1 or 2, o is 1 or 2, p is 0, 1, 2, or 3, and R⁶ is C(═O)OH, S(═O)₂OH, P(═O)(OH)₂, NR⁷R⁸, or a C₁₋₆ aliphatic radical which is substituted by at least one OH group, where R⁷ and R⁸ in each case independently of one another are selected from the group consisting of H and C₁₋₆ aliphatic radicals which are optionally substituted by at least one OH group and mixtures thereof; with the proviso that at least one of the radicals R⁷ and R⁸ is a C₁₋₆ aliphatic radical which is substituted by at least one OH group.
 2. The coating composition (A) as claimed in claim 1, wherein at least 100 ppm of bismuth, based on the total weight of the coating composition (A), are present as component (A3) in a form in which it is in solution in the coating composition (A).
 3. The coating composition (A) as claimed in claim 1, wherein the radical R⁶ is C(═O)OH or is NR⁷R⁸ or is a C₁₋₆ aliphatic radical which is substituted by at least one OH group.
 4. The coating composition (A) as claimed in claim 1, wherein: R¹ is a C₁₋₄ aliphatic radical substituted by at least one OH group, m is 0 or 1, R^(a) and R^(b) in each case independently of one another are selected from the group consisting of H and C₁₋₄ aliphatic radicals, optionally substituted by at least one OH group, and mixtures thereof, R², R³, R⁴, and R⁵ in each case independently of one another are H or are a C₁₋₄ aliphatic radical optionally substituted by at least one OH group, n is 1 or 2, o is 1 or 2, p is 0, 1, or 2, and R⁶ is C(═O)OH, NR⁷R⁸, or a C₁₋₄ aliphatic radical which is substituted by at least one OH group, where R⁷ and R⁸ in each case independently of one another are selected from the group consisting of H and C₁₋₆ aliphatic radicals which are optionally substituted by at least one OH group, and mixtures thereof; with the proviso that at least one of the radicals R⁷ and R⁸ is a C₁₋₆ aliphatic radical which is substituted by at least one OH group.
 5. The coating composition (A) as claimed in claim 1, wherein component (A5) is selected from the group consisting of N,N,N′,N′-tetrakis-2-hydroxypropylethylenediamine, N,N′-bis(2-hydroxyethyl)glycine, N-(tri(hydroxy-methyl)methyl)glycine, N-hydroxyethylaminoacetic acid, triethanolamine, triisopropanolamine, and N,N,N′N′-tetrakis-2-hydroxyethylethylenediamine, and mixtures thereof.
 6. The coating composition (A) as claimed in claim 1, wherein the at least one complexing agent (A5) is present in the aqueous coating composition (A) in a fraction of at least 5 mol %, based on the total amount of bismuth present in the coating composition (A).
 7. The coating composition (A) as claimed in claim 1, wherein components (A3) and (A5) are present in the form of a complex and/or salt of components (A3) and (A5) in the coating composition (A).
 8. The coating composition (A) as claimed in claim 1, wherein the coating composition (A) comprises: (A4) at least 100 ppm of bismuth, based on the total weight of the coating composition (A), in a form in which it is not in solution in the coating composition (A).
 9. The coating composition (A) as claimed in claim 1, wherein the coating composition (A) comprises a total amount of at least 300 ppm of bismuth, based on the total weight of the coating composition (A), including (A3) at least 100 ppm of bismuth, based on the total weight of the coating composition (A), in a form in which it is in solution in the coating composition (A), and (A4) at least 200 ppm of bismuth, based on the total weight of the coating composition (A), in a form in which it is not in solution in the coating composition (A).
 10. The coating composition (A) as claimed in claim 1, wherein the total amount of bismuth present in the coating composition (A) is in a range from at least 500 ppm to 20 000 ppm.
 11. The coating composition (A) as claimed in claim 1, wherein the coating composition (A) is obtainable by at least partly converting at least one water-insoluble bismuth compound, by partial reaction of this compound with at least one at least bidentate complexing agent (A5) suitable for complexing bismuth, into at least one water-soluble bismuth compound (A3) in water, optionally in the presence of at least one of components (A1) and/or (A2), to give a mixture comprising at least components (A3) and (A5), and optionally (A1) and/or (A2) and/or (A4), of the coating composition (A), and optionally mixing the resulting mixture at least with component (A1) and optionally component (A2), to give the coating composition (A).
 12. The coating composition (A) as claimed in claim 1, wherein the binder (A1) is a polymeric resin which has at least partly protonated tertiary amino groups.
 13. The coating composition (A) as claimed in claim 12, wherein the tertiary amino groups each independently of one another have at least two C₁₋₃ alkyl groups each at least singly substituted by a hydroxyl group.
 14. A method for producing the aqueous coating composition (A) as claimed in claim 1, wherein the method comprises at least step (0): (0) at least partly converting at least one water-insoluble bismuth compound, by at least partial reaction of this compound with at least one complexing agent (A5), into at least one water-soluble bismuth compound (A3) in water, to give a mixture comprising at least components (A3) and (A5) and also, optionally, (A4) of the coating composition (A).
 15. A method for producing an electrically conductive substrate comprising coating at least part of an electrically conductive substrate with a coating composition according to claim
 1. 16. A method for at least partly coating an electrically conductive substrate with an electrocoat material, comprising at least a step (1): (1) contacting the electrically conductive substrate, connected as cathode, with the aqueous coating composition (A) as claimed in claim 1, step (1) being carried out in at least two successive stages (1a) and (1b): (1a) at an applied voltage in a range from 1 to 50 V, which is applied over a duration of at least 5 seconds, and (1b) at an applied voltage in a range from 50 to 400 V, with the proviso that the voltage applied in stage (1b) is greater by at least 10 V than the voltage applied in stage (1a).
 17. The method as claimed in claim 16, wherein the voltage applied in stage (1a) is such that the deposition current density is at least 1 A/m².
 18. The method as claimed in claim 16, wherein the voltage applied in stage (1a) is applied over a duration in a range from at least 5 to 300 seconds.
 19. The method as claimed in claim 16, wherein the voltage applied in stage (1b) in the range from 50 to 400 V takes place in a time interval of 0 to 300 seconds after implementation of stage (1a) and is maintained for a period in the range from 10 to 300 seconds at a value within the stated voltage range of 50 to 400 V.
 20. An electrically conductive substrate coated at least partly with the aqueous coating composition (A) as claimed in claim
 1. 21. An article or component produced from at least one substrate as claimed in claim
 20. 22. A method for setting and/or maintaining the concentration of component (A3) and/or optionally (A4) in the coating composition (A) during implementation of the method according to claim 16, wherein at preselected intervals of time, a determination is made of the fraction of component (A3) and/or optionally (A4) in the coating composition (A) in ppm, based on the total weight of the coating composition (A), and the fraction of component (A5) in the coating composition (A) is increased no later than when the fraction of component (A3) in ppm is lower than a preselected setpoint value for this component in the coating composition (A), or the fraction of component (A4) optionally present in the coating composition (A) is increased no later than when the fraction of component (A4) in ppm is lower than a preselected setpoint value for this component in the coating composition (A). 